Particle and fluid simulations of low-temperature plasma discharges: Benchmarks and kinetic effects

Journal of Physics D: Applied Physics

Volumn 38, Issue 19, 2005, Pages

  Kim, H C ^a,b   Iza, F ^a   Yang, S S ^a   Radmilovic Radjenovic M ^a   Lee, J K ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; FLUID DYNAMICS; INDUCTIVELY COUPLED PLASMA;

FLUID SIMULATIONS; ION KINETICS; PLASMA DISCHARGES;

PLASMA APPLICATIONS;

EID: 25144497602     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/38/19/R01     Document Type: Review

References (126)

1. Makabe T 2002 Advances in Low Temperature RF Plasmas: Basis for Process Design (Amsterdam: Elsevier)
2. Birdsall C K and Langdon A B 1985 Plasma Physics via Computer Simulation (New York: McGraw-Hill)
3. Tajima T 1988 Computational Plasma Physics (Redwood city: Addison-Wesley)
4. Tien P K and Moshman J 1956 J. Appl. Phys. 27 1067
5. Buneman O 1959 Phys. Rev. 115 503
6. Birdsall C K and Bridges W B 1961 J. Appl. Phys. 32 2611
7. Dawson J M 1962 Phys. Fluids 2 445
8. Graves D B and Jensen K F 1986 IEEE Trans. Plasma Sci. 14 92
9. Graves D B 1987 J. Appl. Phys. 62 88
10. Park S K and Economou D J 1990 J. Appl. Phys. 68 3904
11. Makabe T and Nakano N 1992 Phys. Rev. A 45 2520
12. Ventzek P L G, Hoekstra R J and Kushner M J 1994 J. Vac. Sci. Technol. B 12 461
13. Deshmukh S and Economou D J 1993 J. Vac. Sci. Technol. B 11 206
14. Paranjpe A P 1994 J. Vac. Sci. Technol. A 12 1221
15. Kondo K, Kuroda H and Makabe T 1994 Appl. Phys. Lett. 65 31
16. Birdsall C K 1991 IEEE Trans. Plasma Sci. 19 65
17. Surendra M and Graves D B 1991 IEEE Trans. Plasma Sci. 19 144
18. Turner M M and Hopkins H B 1992 Phys. Rev. Lett. 69 3511
19. Verboncoeur J P, Alves M V, Vahedi V and Birdsall C K 1993 J. Comput. Phys. 104 321
20. Vahedi V and Surendra M 1995 Comput. Phys. Commun. 87 179
21. Boeuf J P 1987 Phys. Rev. A 36 2782
22. Kinder R L, Ellingboe A R and Kushner M J 2003 Plasma Sources Sci. Technol. 12 561
23. Gogolides E and Sawin H H 1992 J. Appl. Phys. 72 3971
24. Kim H C, Yang S S and Lee J K 2003 J. Appl. Phys. 93 9516
25. Sadiku M 2001 Numerical Techniques in Electromagnetics (Boca Raton, FL: CRC Press)
26. Scharfetter D and Gummel H 1969 IEEE Trans. Electron Devices 16 64
27. Selberherr S 1984 Analysis and Simulation of Semiconductor Devices (Wien: Springer)
28. Passchier J D P and Goedheer W J 1993 J. Appl. Phys. 74 3744
29. Kushner M J 2004 J. Appl. Phys. 95 846
30. Iza F, Yang S S, Kim H C and Lee J K 2005 J. Appl. Phys. at press
31. Hockney R W and Eastwood J W 1981 Computer Simulation Using Particles (New York: McGraw-Hill)
32. Verboncoeur J P 2005 Plasma Phys. Control. Fusion 47 A231
33. Langdon A B 1970 J. Comput. Phys. 6 247
34. Langdon A B and Birdsall C K 1970 Phys. Fluids 13 2115
35. Okuda H 1972 J. Comput. Phys. 10 475
36. Chen L, Langdon A B and Birdsall C K 1974 J. Comput. Phys. 14 200
37. Skullerud H R 1968 Br. J. Appl. Phys. 1 1567
38. Kawamura E, Birdsall C K and Vahedi V 2000 Plasma Sources Sci. Technol. 9 413
39. Hitchon W N G 1999 Plasma Processes for Semiconductor Fabrication (Cambridge: Cambridge University Press) p 161
40. Vahedi V, DiPeso G, Birdsall C K, Lieberman M A and Rognlien T D 1993 Plasma Sources Sci. Technol. 2 261
41. Manuilenko O 2004 private communication
42. Meyer P and Wunner G 1997 Phys. Plasmas 4 3152
43. Shon C H, Lee H J and Lee J K 2001 Comput. Phys. Commun. 141 322
44. Sommerer T J and Kushner M J 1992 J. Appl. Phys. 71 1654
45. Lee J K and Birdsall C K 1979 Phys. Fluids 22 1315
46. Porteous R K and Graves D B 1991 IEEE Trans. Plasma Sci. 19 204
47. Lee J K and Verboncoeur J P 2001 Low Temperature Plasma Physics ed R Hippler et al (Berlin: Wiley-VCH) p 367
48. Boeuf J P 2003 J. Phys. D: Appl. Phys. 36 R53
49. Rauf S and Kushner M J 1999 J. Appl. Phys. 85 3460
50. Punset C, Cany S and Boeuf J P 1999 J. Appl. Phys. 86 124
51. Shin Y K, Shon C H, Kim W and Lee J K 1999 IEEE Trans. Plasma Sci. 27 1366
52. Yang S S, Kim H C, Ko S W and Lee J K 2003 IEEE Trans. Plasma Sci. 31 596
53. Lee H J, Kim H C, Yang S S and Lee J K 2002 Phys. Plasmas 9 2822
54. Kim H C, Hur M S, Yang S S, Shin S W and Lee J K 2002 J. Appl. Phys. 91 9513
55. Kim H C, Yang S S and Lee J K 2002 IEEE Trans. Plasma Sci. 30 188
56. Yang S S, Lee J K, Ko S W, Kim H C and Shon J W 2004 Contrib. Plasma Phys. 44 536
57. Drallos P J, Nagorny V P and Williamson W Jr 1995 Plasma Sources Sci. Technol. 4 576
58. Shin Y K, Lee J K, Shon C H and Kim W 1999 Japan. J. Appl. Phys. 38 L174
59. Fridman A, Chirokov A and Gutsol A 2005 J. Phys. D: Appl. Phys. 38 R1
60. Tachibana K, Mizokami K, Kosugi N and Sakai T 2003 IEEE Trans. Plasma Sci. 31 68
61. Shintani Y, Ahn J C, Tachibana K, Sakai T and Kosugi N 2003 J. Phys. D: Appl. Phys. 36 2928
62. Yang S S, Ko S W, Kim H C, Mukherjee S and Lee J K 2003 Proc. Int. Meeting on Information Display (Daegu, Korea) p 739
63. Motoyama Y, Matsuzaki H and Murakami H 2001 IEEE Trans. Electron Devices 48 1568
64. Choi E H, Lim J Y, Kim Y G, Ko J J, Kim D I, Lee C W and Cho G S 1999 J. Appl. Phys. 86 6525
65. Piscitelli D, Pitchford L C and Boeuf J P 2000 Proc. Int. Display Workshps (Kobe, Japan) p 735
66. Hagelaar G J M and Kroesen G M W 2000 J. Appl. Phys. 88 2240
67. Yang S S, Kim S J and Lee J K 2004 J. Plasma Fusion Res. 80 132
68. Yang S S, Ko S W, Mukherjee S and Lee J K 2003 Proc. Int. Display Workshops (Fukuoka, Japan) p 885
69. Verboncoeur J P, Langdon A B and Gladd N T 1995 Comput. Phys. Commun. 87 199
70. Park W B, Lim J Y, Oh J S, Jeong H S, Cho G S and Choi E H 2003 Int. Display Workshops (Fukuoka, Japan) p 973
71. Cho G, Choi E H, Kim Y G, Kim D I, Uhm H S, Joo Y D, Han J G and Kim M C 2000 J. Appl. Phys. 87 4113
72. Callegari Th, Ganter R, Guillot Ph, Galy J and Boeuf J P 1999 Proc. Int. Display Workshops (Sendai, Japan) p 663
73. Shon C H and Lee J K 2001 Phys. Plasmas 8 1070
74. Lee J K, Dastgeer S, Shon C H, Hur M S, Kim H C and Cho S W 2001 Japan. J. Appl. Phys. 40 528
75. Kolobov V I and Godyak V A 1995 IEEE Trans. Plasma Sci. 23 503
76. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley)
77. Chen F F and Chang J P 2003 Lecture Notes on Principles of Plasma Processing (New York: Kluwer/Plenum)
78. Raizer Yu P, Shneider M N and Yatsenko N A 1995 Radio-Frequency Capacitive Discharges (Boca Raton: CRC Press)
79. Roth J R 2001 Industrial Plasma Engineering Vol. 2: Applications to Nonthermal Plasma Processing (Bristol: Institute of Physics Publishing)
80. Fridman A and Kennedy L A 2004 Plasma Physics and Engineering (New York: Taylor and Francis)
81. Surendra M and Graves D B 1991 Appl. Phys. Lett. 59 2091
82. Goto H H, Lowe H D and Ohmi T 1992 J. Vac. Sci. Technol. A 10 3048
83. Kitajima T, Takeo Y and Makabe T 1999 J. Vac. Sci. Technol. A 17 2510
84. Robiche J, Boyle P C, Turner M M and Ellingboe A R 2003 J. Phys. D: Appl. Phys. 36 1810
85. Kim H C, Lee J K and Shon J W 2003 Phys. Plasmas 10 4545
86. Kim H C and Lee J K 2005 J. Vac. Sci. Technol. A 23 651
87. Kim H C and Lee J K 2004 Phys. Rev. Lett. 93 085003
88. Kim H C and Lee J K 2005 Phys. Plasmas 12 053501
89. Godyak V A and Piejak R B 1990 Phys. Rev. Lett. 65 996
90. Kaganovich I D 2002 Phys. Rev. Lett. 89 265006
91. Kim H C, Park G Y and Lee J K 2005 submitted
92. Radmilović-Radjenović M and Lee J K 2005 Phys. Plasmas 12 063501
93. Shon J W 2004 private communication
94. Kropotov N Yu, Kachanov Yu A, Reuka A G, Lisovskiy V A, Erorenkov V D and Farenik V 1988 Sov. Tech. Phys. Lett. 14 159
95. Lisovskiy V A and Yegorenkov V D 1994 J. Phys. D: Appl. Phys. 27 2340
96. Radmilović-Radjenović M, Lee J K, Iza F and Park G Y 2005 J. Phys. D: Appl. Phys. 38 950
97. Vaughan J R M 1989 IEEE Trans. Electron Devices 36 1963
98. Vaughan J R M 1993 IEEE Trans. Electron Devices 40 830
99. Phelps A V and Petrović Z Lj 1999 Plasma Sources Sci. Technol. 8 R21
100. Phelps A V, Pitchford L C, Pedoussat C and Donko Z 1999 Plasma Sources Sci. Technol. 8 B1
101. Theiberger P, Hanson A L, Steski D B, Zajic V, Zhang S Y and Ludewig H 2000 Phys. Rev. A 61 042901
102. Thomas E W 1984 Nucl. Fusion 94 94
103. Kim H C, Manuilenko O and Lee J K 2005 Japan. J. Appl. Phys. 44 1957
104. Vahedi V, DiPeso G, Birdsall C K, Lieberman M A and Rognlien T D 1993 Plasma Sources Sci. Technol. 2 273
105. Schweigert I V and Schweigert V A 2004 Plasma Sources Sci. Technol. 13 315
106. Kawamura E, Vahedi V, Lieberman M A and Birdsall C K 1999 Plasma Sources Sci. Technol. 8 R45
107. Babaeva N Yu, Shon J W, Hudson E A and Lee J K 2005 J. Vac. Sci. Technol. A 24 699
108. Lee J K, Manuilenko O V, Babaeva N Yu, Kim H C and Shon J W 2005 Plasma Sources Sci. Technol. 14 89
109. Wild C and Koidl P 1991 J. Appl. Phys. 69 2909
110. Godyak V A, Piejak R B and Alexandrovich B M 1992 Phys. Rev. Lett. 68 40
111. Hopwood J 1992 Plasma Sources Sci. Technol. 1 109
112. Hopwood J, Guarnieri C R, Whitehair S J and Cuomo J J 1993 J. Vac. Sci. Technol. A 11 152
113. Turner M M 1993 Phys. Rev. Lett. 71 1844
114. Kolobov V I and Economou D J 1997 Plasma Sources Sci. Technol. 6 R1
115. Wu X and Lieberman M A 2000 Plasma Sources Sci. Technol. 9 210
116. Kim S S, Chang H Y and Chang C S 2000 Appl. Phys. Lett. 77 492
117. Meziani T, Colpo P and Rossi F 2001 Plasma Sources Sci. Technol. 10 276
118. Vasenkov A V and Kushner M J 2002 Phys. Rev. E 66 066411
119. Hoekstra R J and Kushner M J 1996 J. Appl. Phys. 79 2275
120. Evans J D and Chen F F 2001 Phys. Rev. Lett. 86 5502
121. Cohen R H and Rognlien T D 1996 Plasma Sources Sci. Technol. 5 442
122. Godyak V A, Piejak R B and Alexandrovich B M 1999 Phys. Rev. Lett. 83 1610
123. Godyak V A and Kolobov V I 1997 Phys. Rev. Lett. 79 4589
124. Rauf S and Kushner M 1997 Plasma Sources Sci. Technol. 6 518
125. Tyshetskiy Yu O, Simolyakov A I and Godyak V A 2002 Plasma Sources Sci. Technol. 11 203
126. Godyak V A and Kolobov V I 1997 Phys. Rev. Lett. 81 369