Plasma display panels: Physics, recent developments and key issues

Journal of Physics D: Applied Physics

Volumn 36, Issue 6, 2003, Pages

  Boeuf, J P ^a  

^a UNIVERSITÉ PAUL SABATIER   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC BARRIER DISCHARGES (DBD);

DIELECTRIC MATERIALS; FLUORESCENT LAMPS; IMAGE QUALITY; LIGHT EMISSION; LIGHT EMITTING DIODES;

PLASMA DISPLAY DEVICES;

EID: 0037459323     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/36/6/201     Document Type: Review

References (197)

1. Mentley D E and Stanford Ressources 2001 Bay Area Chapter - Society for Information Display - After-work Monthly Seminar Series http://www.ba-sid.org/Archives/2001/BA-SID%20Sept-01-dem-sr.pdf
2. Poor A 2002 Display Europe 20
3. Weston G F 1975 J. Phys. E 8 981
4. Bitzer D L and Slottow H G 1966 AFIPS Conf. Proc. vol 29, p 541
5. Slottow H G 1976 IEEE Trans. Electron Devices ED-23 760
6. Weber L F 1985 Flat Panel Displays and CRTs vol, chapter 10, ed L E Tannas Jr (New York: van Nostrand Reinhold) p 332
7. Michel J P 1989 Display Engineering ed D Bosman (Amsterdam: North Holland) p 185
8. Sobel A 1991 IEEE Trans. Plasma Sci. 19 1033
9. Shinoda T and Niinuma A 1984 SID, 84 172
10. Shinoda T, Wakitani M, Nanto T, Yoshikawa K, Ohtsuka A and Hirose T 1993 SID, 93 161
11. Shinoda T, Wakitani M, Nanto T, Kurai T, Awaji N and Suzuki M 1991 SID, 91 724
12. Dick G W and Biazzo M R 1976 IEEE Trans. Electron Devices ED-23 429
13. Dick G W and Biazzo M R 1979 IEEE Trans. Electron Devices ED-26 1168
14. Holz G E 1972 SID, 72 36
15. Murakami H and Toyonaga R 1982 IEEE Trans. Electron Devices 29 988
16. Yamamoto T, Kuriyama T, Seki M, Katoh T, Murakami H, Shimada K and Ishiga H 1993 SID, 93 165
17. Kamegaya T, Matsuzaki H and Yokozawa M 1978 IEEE Trans. Electron Devices ED-25 1094
18. Mikoshiba S, Shinada S, Takano H and Fukushima M 1979 IEEE Trans. Electron Devices ED-26 1177
19. Mikoshiba S, Shinada S and Shirai S 1985 J. Appl. Phys. 58 3720
20. Kariya K, Kanazawa Y and Hirose T 2002 J. SID 10 11
21. Yamaguchi T, Toda K, Zhu Y W, Shiga T, Mikoshiba S, Ueda T, Kariya K and Shinoda T 1999 J. SID 7 227
22. Kogelschatz U, Eliasson B and Egli W 1999 Pure Appl. Chem. 71 1819
23. Tanaka Y 1955 J. Opt. Soc. Am. 45 710
24. Komaki T, Tanigushi H and Amemyia K 1999 Int. Display Workshop IDW'99 587
25. Sato Y, Amemiya K and Uchidoi M 2002 J. SID 10 17
26. Toyoda O, Kosaka F N T, Tokai A, Inoue H and Betsui K 1999 Int. Display Workshop IDW'99 599
27. Hashimoto Y, Seo Y, Toyoda O, Betsui K, Kosaka F N T, Tokai A and Namiki F 2002 J. SID 10 151
28. Sano K, Nakamura T, Numomura K, Konishi Z, Usui M, Tanaka A, Yoshida Z, Yamada H, Oida O and Fujimura R 1998 SID, 98 275
29. Deschamps J and Doyeux H 1997 Phys. World 39
30. Doyeux H 2000 SID, 00 212
31. Meunier J, Belenguer P and Boeuf J P 1995 J. Appl. Phys. 78 731
32. Punset C. Boeuf J P and Pitchford L C 1998 J. Appl. Phys. 83 1884
33. Slottow H G and Petty W D 1971 IEEE Trans. Electron Devices ED-18 650
34. Sahni O and Lanza C 1977 IEEE Trans. Electron Devices ED-24 853
35. Slottow H G 1977 IEEE Trans. Electron Devices ED-24 848
36. Gillies M F and Oversluizen G 2002 J. Appl. Phys. 31 6315
37. Nakamura T, Iseki K, Sano Y and Nunomura K 1995 SID, 95 807
38. Punset C, Cany S and Boeuf J P 1999 J. Appl. Phys. 86 124
39. Johnson R J, Bitzer D L and Slottow G H 1971 IEEE Trans. Electron Devices ED-18 642
40. Weber L F, Warren K W and Weikart G S 1986 IEEE Trans. Electron Devices ED-33 1159
41. Weber L 1998 Proc. Asia Display 98 15
42. Weitbruch S, Zwing R and Correa C 2001 J. SID 9 279
43. Yoshikawa K, Kanazawa Y, Wakitani W, Shinoda T and Ohtsuka A 1992 Japan. Display 92 605
44. Seki S. Ishii M, Shiga T, Igarashi K and Mikoshiba S 2000 SID, 00 714
45. Pejovic M M, Ristic G S and Karamarkovic J P 2002 J. Phys. D: Appl. Phys. 35 R91
46. Ishii M, Takeda Y, Shiga T, Igarashi K and Mikoshiba S 2000 J. SID 8 217
47. Röpcke J and Zahn R J 1990 Contrib. Plasma Phys. 30 511
48. Kudrle V, LeDc E and Fitaire M 2049 J. Phys. D: Appl. Phys. 32 2049
49. Röpcke J, Zimdahl T, Schlott D and Glaefeke H 1990 Contrib. Plasma Phys. 30 679
50. Weber L 1998 US Patent 5745086
51. Nagorny V, Drallos P and Weber L 2000 SID, 00 114
52. Kim J K, Chung W J, Seo J H and Whang K W 2001 KIDS J. Inform. Display 2 24
53. Boeuf J P, Kang J, Caillier B, Callegari T, Ganter R, Ouyang J, Pitchford L C and Punset C 2001 Int. Meeting Inform. Display IMID'01 113
54. Tachibana K, Feng S and Sakai T 2000 J. Appl. Phys. 88 4967
55. Hagelaar G J M, Klein M H, Snijkers R J M and Kroesen G M W 2001 J. Appl. Phys. 86 2033
56. Shiga T, Igarashi K and Mikoshiba S 1998 Int. Display Workshop FDW'98 487
57. Oversluizen G, Klein M, deZwart S, vanHeusden S and Dekker T 2000 Appl. Phys. Lett. 77 948
58. Oversluizen G, deZwart S, Dekker T and Gillies M F 2002 SID, 02 848
59. Betsui K. Namiki F, Kanazawa Y and Inoue H 1999 FUJITSU Sci. Tech. J. 35 229
60. Kariya K, Kanazawa Y and Hirose T 2002 J. SID 10 11
61. Weber L 2000 SID, 00 402
62. Schindler W C 1999 Int. Display Workshop IDW'99 735
63. Kaelber T, Walther M, Vos M, Julius P, Pallhorn S. Buzak T S, Ilcisin K J and Hinchliffe R D 2000 SID, 00 487
64. Kuromitsu Y, Toriumi M, Toyoda S and Kanda Y 1999 SID, 99 10
65. Ganter R, Callegari T, Pitchford L C and Boeuf J P 2002 Appl. Surf. Sci. 192 2999
66. Suzuki K, Kawanami Y, Ho S, Uemura N, Yajima Y, Kouchi N and Hatano Y 2000 J. Appl. Phys. 88 5605
67. Ikeda Y, Verboncoeur J P, Christenson P J and Birdsall C K 1999 J. Appl. Phys. 86 2431
68. Boeuf J P, Punset C, Hirech A and Doyeux H 1997 J. Phys. IV France 7 C4-3
69. Postel O B and Capelli M A 2000 Appl. Phys. Lett. 76 544
70. Postel O B and Capelli M A 2001 J. Appl. Phys. 89 4719
71. Noborio M, Yoshioka T, Sano Y and Nunomura K 1994 SID, 94 727
72. Sahni O, Lanza C and Howard W E 1978 J. Appl. Phys. 49 2365
73. Veronis G, Inan U S and Pasko V P 2000 IEEE Trans. Plasma Sci. 28 1271
74. Min B K, Lee S H and Park H G 2000 J. Vac. Sci. Technol. A 18 349
75. Hachigushi S and Tachibana K 2001 Japan. J. Appl. Phys. 40 1448
76. Uchida S, Sugawara H, Sakai Y, Watanabe T and Hong B H 2001 J. Phys. D: Appl. Phys. 34 947
77. Rauf S and Kushner M J 1999 J. Appl. Phys. 85 3460
78. Seo J H, Chung W J, Yoon C K, Kim J K and Whang K W 2001 IEEE Trans. Plasma Sci. 29 824
79. Uchida S, Sugawara H, Sakai Y, Watanabe T and Hong B H 2000 J. Phys. D: Appl. Phys. 33 62
80. Kurihara M and Makabe T 2001 J. Appl. Phys. 89 7756
81. Pitchford L C, Kang J, Punset C and Boeuf J P 2002 J. Appl. Phys. 92 6990
82. Sommerer T J 1996 J. Phys. D: Appl. Phys. 29 769
83. Sommerer T J and Doughty D A 1998 J. Phys. D: Appl. Phys. 31 2803
84. Mikoshiba S and Murayama S 1980 Appl. Phys. Lett. 37 529
85. Oversluizen G, Klein M, deZwart S, vanHeusden S and Dekker T 2002 J. Appl. Phys. 91 2403
86. Boeuf J P, Callegari T, Punset C and Ganter R 1998 Proc. Asia Display'98 p 209
87. Okigawa A, Yoshioka T and Toki K 1999 SID, 99 276
88. Dekker T, Oversluizen G, Gillies M F and Zwart S d 2001 Int. Display Workshop IDW'01 917
89. Uchiike H, Miura K, Nakayama N, Shinoda T and Fukushima Y 1976 IEEE Trans. Electron Devices ED-23 1211
90. Byrum B W Jr 1975 IEEE Trans. Electron Devices ED-22 685
91. Urade T, Iemori T, Osawa M, Nakayama N and Morita I 1976 IEEE Trans. Electron Devices ED-23 313
92. Bachmann P K, Elsbergen V v, Wiechert D U, Zhong G and Robertson J 2001 Diamond Relat. Mater. 10 809
93. Sasaki T, Harano Y, Kawai Y, Kamiya M, Uchiike H and Lin H 1996 SID, 96 283
94. Hirakawa T, Uchiike H and Zhang S 2000 Int. Display Workshop IDW'00 691
95. Elsbergen V v, Backmann P K and McGrath C 2001 Int. Display Workshop IDW'01 937
96. Kim R, Kim Y, Cho J and Park J W 2000 J. Vac. Sci. Technol. A 18 2493
97. Kim R, Kim Y and Park J W 2000 Thin Solid Films 376 183
98. Cho J, Kim R, Lee K W, Yeom G Y, Kim J Y and Park J W 1999 Thin Solid Films 350 173
99. Cho J and Park J W 2000 J. Vac. Sci. Technol. A 18 329
100. Elsbergen V v, Bachmann P K and Zhong G 2000 Int. Display Workshop IDW'00 687
101. Choi E H, Oh H J, Kim Y G, Ko J J, Lim J Y, Kim J G, Kim D I, Cho G and Kang S O 1998 Japan. J. Appl. Phys. 37 7015
102. Kim D I, Lim J Y, Kim Y G, Ko J J, Lee C W, Cho G S and Choi E H 2000 Japan. J. Appl. Phys. 39 1890
103. Ishimoto M, Hidaka S and Betsui K 1999 SID, 99 552
104. Chou N J 1977 J. Vac. Sci. Technol. 14 307
105. Moon K S, Lee J and Whang K W 1999 J. Appl. Phys. 86 4049
106. Phelps A V and Petrovic Z L 1999 Plasma Sources Sci. Technol. 8 R21
107. Sahni O and Lanza C 1976 J. Appl. Phys. 47 5107
108. Auday G, Guillot P and Galy J 2000 J. Appl. Phys. 88 4871
109. Aboelfotoh M O and Lorenzen J A 1977 J. Appl. Phys. 48 4754
110. O'Hanlon J F 1978 IBM J. Res. Dev. 22 626
111. Elsbergen V v, Bachmann P K and Juestel T 2000 SID, 00 220
112. Sahni O and Lanza C 1981 J. Appl. Phys. 52 196
113. Delplancke-Ogletree M P, Ye M, Winand R, Marneffe J F d and Deltour R 1998 J. Mater. Res. 14 2133
114. Holt S A, Jones C F, Watson G S, Crossley A, Johnston C, Sofield C and Myhra S 1997 Thin Solid Films 292 96
115. Hagstrum H D 1956 Phys. Rev. 104 672
116. Hagstrum H D 1961 Phys. Rev. 122 83
117. Motoyama Y, Matsuzaki H and Murakami H 2001 IEEE Trans. Electron Devices 48 1568
118. Yoon S J, Lee I, lee J W and Oh B 2001 Japan. J. Appl. Phys. 40 809
119. Nagorny V P and Drallos P J 1997 Plasma Sources Sci. Technol. 6 212
120. Murakami Y, Matsuzaki H and Ikuta N 2001 Japan. J. Appl. Phys. 40 3382
121. McClure G W 1961 Phys. Rev. 124 969
122. Abril I, Gras-Marti A and Valles-Abarca J A 1983 Phys. Rev. A 28 3677
123. Revel I, Pitchford L C and Boeuf J P 2000 J. Appl. Phys. 88 2234
124. Shin Y K, Lee J K, Shon C H and Kim W 1999 Japan. J. Appl. Phys. 38 L174
125. Hagelaar G J M, Kroesen G M W and Klein M H 2000 J. Appl. Phys. 88 2240
126. Yoon S and Lee I 2002 J. Appl. Phys. 91 2487
127. Piscitelli D, Pitchford L C and Boeuf J P 2000 Int. Display Workshop IDW'00 735
128. Piscitelli D, Ganter R, Callegari T, Pitchford L C and Boeuf J P 2001 Int. Display Workshop IDW'01 825
129. Piscitelli D, Revel I, Pitchford L C and Boeuf J P 2003 to be published
130. Capdeville H, Pedoussat C and Pitchford L C 2001 J. Appl. Phys. 91 1026
131. Ziegler J F, Biersak J P and Littmark U 1985 The Stopping and Range of Ions in Matter
132. Mace C, Guillaumet S, Schwebel C and Aubert J 1999 Proc. Eurodisplay 99 p 69
133. Bechtel H, Jüstel T, Gläser H and Wiechert D U 2002 J. SID 10 63
134. Sahni O and Lanza C 1976 J. Appl. Phys. 47 1337
135. Veerasingam R, Campbell R B and McGrath R T 1995 IEEE Trans. Plasma Sci. 23 688
136. Veerasingam R, Campbell R B and McGrath R T 1996 IEEE Trans. Plasma Sci. ED-24 1399
137. Takahashi K, Hashigushi S, Murakami Y, Takei M, Itoh K, Tachibana K and Sakai T 1996 Japan. J. Appl. Phys. 35 251
138. Veerasingam R, Campbell R B and McGrath R T 1997 Plasma Sources Sci. Technol. 6 157
139. McGrath R T, Veerasingam R, Hunter J A, Rockett P D and Campbell R B 1998 IEEE Trans. Plasma Sci. 26 1532
140. Uchiike H, Tuchiya N A H, Shinoda T and Fukushima Y 1984 IEEE Trans. Electron Devices ED-31 943
141. Uchiike H, Fukuda M, Manabe A and Hirata T 1992 SID, 92 543
142. Boeuf J P and Doyeux H 1996 Europhys. News 27 46
143. Boeuf J P and Pitchford L C 1996 IEEE Trans. Plasma Sci. 24 95
144. Campbell R B, Veerasingam R and McGrath R T 1995 IEEE Trans. Plasma Sci. ED-23 698
145. Veerasingam R, Campbell R B and McGrath R T 1996 IEEE Trans. Plasma Sci. 24 1411
146. Jeong H S, Shin B J and Whang K W 1999 IEEE Trans. Plasma Sci. 27 171
147. Rauf S and Kushner M J 1999 J. Appl. Phys. 85 3470
148. Veronis G and Inan U S 2002 J. Appl. Phys. 91 9502
149. Murakami Y, Matzuzaki H, Murakami K and Tachibana K 2000 Japan. J. Appl. Phys. 39 590
150. Drallos P J, Khudik V N and Nagorny V P 1998 SID, 98 632
151. Jeong H S, Murakami Y, Seki M and Murakami H 2001 IEEE Trans. Plasma Sci. 29 559
152. Kim H C, Hur M S, Yang S S, Shin S W and Lee J K 2002 J. Appl. Phys. 91 9513
153. Callegari T, Ouyang J, Lebarq N, Caillier B and Boeuf J P 2002 International Display Research Conf., Eurodisplay 2002 p 735
154. Ikeda Y, Suzuki K, Fukumoto H, Verboncoeur J P, Christenson P J, Birdsall C K, Shibata M and Ishigaki M 2000 J. Appl. Phys. 88 6216
155. Lee J K, Dagsteer S, Shon C H, Hur M S, Kim H C and Cho S 2001 Japan. J. Appl. Phys. 40 L528
156. Hagelaar G J M, deHoog F J and Kroesen G M W 2000 Phys. Rev. E 62 1452
157. Hagelaar G L M and Kroesen G M W 2000 J. Comp. Phys. 159 1
158. Shon C H and Lee J K 2001 Phys. Plasmas 8 1070
159. Holstein T 1951 Phys. Rev. 83 1159
160. Hagelaar G J M, Klein M H, Snijkers R J M and Kroesen G M W 2000 J. Appl. Phys. 88 5538
161. Straaten T v d and Kushner M J 2000 J. Appl. Phys. 87 2700
162. Tamida T, Sanders S J and Tanaka M 2000 Japan. J. Appl. Phys. 39 583
163. Lee H J, Kim H C, Yang S S and Lee J K 2002 Phys. Plasmas 9 2822
164. Yoshioka T, Tessier L, Okigawa A and Toki K 2000 J. SID 8 203
165. Tachibana K, Kosugi N and Sakai T 1994 Appl. Phys. Lett. 65 935
166. Sawa M, Uchiike H, Zhang S and Yoshida K 1998 SID, 98
167. Sawa M, Uchiike H and Yoshida K 2000 J. SID 8 163
168. Yoon C K, Seo J H and Whang K W 2000 IEEE Trans. Plasma Sci. 28 1029
169. Jeong H S, Seo J H, Yoon C K, Kim J K and Whang K W 1999 J. Appl. Phys. 85 3092
170. Amemiya K, Nozu M, Torisaki Y, Uchidori M, Nishio T and Tamura M 1995 Proc. Asia Display 95 965
171. Callegari T, Ganter R and Boeuf J P 2000 J. Appl. Phys. 88 3905
172. Ganter R, Ouyang J, Callegari T and Boeuf J P 2002 J. Appl. Phys. 91 992
173. Ganter R, Ouyang J, Callegari T and Boeuf J P 2002 J. Appl. Phys. 91 1000
174. Kim J H, Lee J H, Whang K W and Choi Y W 2001 J. Appl. Phys. 89 2539
175. Noguchi Y, Matsuoka A, Bowden M D, Uchino K and Muraoka K 2001 Japan. J. Appl. Phys. 40 326
176. Noguchi Y, Matsuoka A, Uchino K and Muraoka K 2002 J. Appl. Phys. 91 613
177. Hagiwara K, Ushirozawa M, Jeong H S, Takano Y and Seki M 1998 Int. Display Workshop IDW'98 615
178. Cho G, CHoi E H, Kim Y G, Kim D I, Uhm H S, Yoo Y D, Han J G, Kim M C and Kim J D 2000 J. Appl. Phys. 87 4113
179. Ganter R, Callegari T and Boeuf J P 2001 J. SID 9 273
180. Ouyang J, Ganter R, Callegari T and Boeuf J P 2002 IEEE Trans. Plasma Sci. 30 186
181. Vink T J, Verbeek R G F A and Zwart S T d 2000 SID, 00 163
182. Ouyang J, Callegari T, Lebarq N, Caillier B and Boeuf J P 2002 International Display Research Conf., Eurodisplay 2002 p 53
183. Oversluizen G, deZwart S, vanHeusden S and Dekker T 2000 J. SID 8 197
184. Oversluizen G, deZwart S, vanHeusden S and Dekker T 2001 J. SID 9 267
185. Yoshioka T, Miyakoshi A, Okigawa A, Mizobata E and Toki K 2000 Int. Display Workshop IDW'00 611
186. Weber L F 2001 US Patent 6184848B1
187. Kang J, Jeon W G, Kim O D, Song J W, Boeuf J P and Park M H 1999 Int. Display Workshop IDW'99 691
188. Kang J, Kim O D, Jeon W G, Song J W, Park J, Lim J R and Boeuf J P 2000 Int. Display Workshop IDW'00 643
189. Kurihara M and Makabe T 1999 IEEE Trans. Plasma Sci. 27 1372
190. Cany S, Kang J, Punset C and Boeuf J P 1999 Int. Display Workshop IDW'99 751
191. Kang J 2000 J. SID 8 223
192. Surendra M 1995 Plasma Sources Sci. Technol. 4 56
193. Hargis P J et al 1994 Rev. Sci. Instrum. 65 140
194. Kanagu S, Kanazawa Y, Shinoda T, Yoshikawa K and Nanto T 1992 SID, 92 713
195. Seguin A, Tessier L, Doyeux H and Salavin S 1999 Int. Display Workshop IDW'99 699
196. Bolsig Bolzmann Equation Solver http://www.siglo-kinema.com
197. Piscitelli D, Phelps A V, Urquijo J d, Basurto E and Pitchford L C in preparation