Two-dimensional CT images of two-frequency capacitively coupled plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 5, 1999, Pages 2510-2516

  Kitajima, T ^a   Takeo, Y ^a   Makabe, T ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033466459     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581989     Document Type: Article

References (31)

1. Y. Gotoh and T. Kure, Jpn. J. Appl. Phys., Part 1 34, 2132 (1995).
2. N. Ikegami, A. Yabata, T. Matsui, J. Kanamori, and Y. Horiike, Jpn. J. Appl. Phys., Part 1 36, 2470 (1997).
3. H.H. Goto, H.-D. Lowe, and T. Ohmi, J. Vac. Sci. Technol. A 10, 3048 (1992).
4. H. H. Goto, H.D. Lowe, and T. Ohmi, IEEE Trans. Semicond. Manuf. 6, 58 (1993).
5. V. Vahedi, C. K. Birdsall, M. A. Lieberman, G. DiPeso, and T. D. Rognlien, Phys. Fluids B 5, 2719 (1993).
6. T. Kitamura, N. Nakano, and T. Makabe, Plasma Sources Sci. Technol. 2, 40 (1993).
7. S. Samukawa, H. Ohtake, and T. Tsukada, J. Vac. Sci. Technol. A 14, 3004 (1996).
8. S. Kakuta, T. Makabe, and F. Tochikubo, J. Appl. Phys. 74, 4907 (1993).
9. S. Kakuta, T. Kitajima, Y. Okabe, and T. Makabe, Jpn. J. Appl. Phys., Part 1 33, 4335 (1994).
10. T. Kitajima, Y. Takeo, N. Nakano, and T. Makabe, J. Appl. Phys. 84, 5928 (1998).
11. T. Tatsumi, H. Hayashi, S. Morishita, S. Noda, M. Okigawa, N. Itabashi, Y. Hikosaka, and M. Inoue, Jpn. J. Appl. Phys., Part 1 37, 2394 (1998).
12. W. Tsai, G. Mueller, R. Lindquist, B. Frazier, and V. Vahedi, J. Vac. Sci. Technol. B 14, 3276 (1996).
13. C. W. Garginer, Handbook of Stocastic Methods (Springer, Berlin, 1983).
14. D. V. O'Connor and D. Phillips, Time-Correlated Single-Photon Counting (Academic, London, 1985).
15. T. Kokubo, F. Tochikubo, and T. Makabe, Appl. Phys. Lett. 56, 818 (1990).
16. F. Tochikubo, T. Kokubo, S. Kakuta, A. Suzuki, and T. Makabe, J. Phys. D 23, 1184 (1990).
17. S. Djurović, J. R. Roberts, M. A. Sobolewski, and J. K. Olthoff, J. Res. Natl. Inst. Stand. Technol. 98, 159 (1993).
18. T. Kitajima, M. Izawa, R. Hashido, N. Nakano, and T. Makabe, Appl. Phys. Lett. 69, 758 (1996).
19. T. Kitajima, M. Izawa, N. Nakano, and T. Makabe, J. Phys. D 30, 1783 (1997).
20. M. Deutsch and I. Beniaminy, J. Appl. Phys. 54, 137 (1983).
21. S. Gueron and M. Deutsch, J. Appl. Phys. 75, 4313 (1994).
22. W. L. Wiese, J. W. Brault, K. Danzmann, V. Helbig, and M. Kock, Phys. Rev. A 39, 2461 (1989).
23. ;M. J. G. Borge and J. Campos, Physica (Utrecht) 119C, 359 (1983).
24. G. Inoue, D. W. Setser, and N. Sadeghi, J. Chem. Phys. 76, 977 (1982).
25. M. V. Malyshev and V. M. Donnelly, J. Vac. Sci. Technol. A 15, 550 (1997).
26. V. Vujnović and W. L. Wiese, J. Chem. Ref. Data 21, 919 (1992).
27. A. Savitzky and M. J. E. Golay, Anal. Chem. 36, 1627 (1964).
28. H. H. Madden, Anal. Chem. 50, 1383 (1978).
29. V. A. Godyak and R. B. Piejak, J. Vac. Sci. Technol. A 8, 3833 (1990).
30. A. A. Howling, J.-L. Dorier, Ch. Hollensten, U. Kroll, and F. Finger, J. Vac. Sci. Technol. A 10, 1080 (1992).
31. U. Kortshagen, I. Pukropski, and L. D. Tsendin, Phys. Rev. E 51, 6063 (1995).