Industrial plasma engineering: Volume 2: Applications to nonthermal plasma processing

Industrial Plasma Engineering: Volume 2: Applications to Nonthermal Plasma Processing

Volumn 2, Issue , 2001, Pages 1-628

  Roth, J Reece ^a  

^a University of Tennessee Knoxville   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84899703059     PISSN: None     EISSN: None     Source Type: Book    
DOI: None     Document Type: Book

References (386)

1. Bohdansky J, Roth J and Bay H L 1980 An analytical formula and important parameters for low-energy ion sputtering J. Appl. Phys. 51 2861-5
2. Langley R A, Bohdansky J, Eckstein W, Mioduszewski W P, Roth J, Taglauer E, Thomas E W, Verbeek H and Wilson K L 1984 Data Compendium for Plasma-Surface Interactions (Vienna: IAEA) ISBN 92-0-139084-X
3. Molchanov V A and Tel’kovskii V G 1961 Variation of the cathode sputtering coefficient as a function of the angle of incidence of ions on a target Sov. Phys.-Dokl. 6 137-8
4. Perry T S 1993 Coming clean IEEE Spectrum 30 20-6
5. Rakowski W 1989 Plasma modification of wool under industrial conditions Melliand Textilberichte 70 780-5
6. Roth J, Eckstein W, Gauthier E and Laszlo J 1991 Sputtering of low-Z materials J. Nucl. Mater. 179-181 34-6
7. Thomas E W (ed) 1985 Atomic data for controlled fusion research volume III: particle interactions with surfaces ORNL Report 6088/V3
8. Wiffen F W 1984 Materials requirements and potential solutions for fusion reactors Proc. IEEE Minicourse on Fusion Experimental/Reactor Systems (17 May, St Louis, MO) unpublished
9. Winters H F 1980 Elementary Processes at Solid Surfaces Immersed in Low Pressure Plasmas (Topics in Current Chemistry 94, Plasma Chemistry III) ed S Veprek and M Venugopalan (New York: Springer) ISBN 0-387-10166-7, pp 69-125
10. Ayrton H 1902 The Electric Arc (New York: Van Nostrand)
11. Barber H 1983 Electroheat (New York: Granada) ISBN 0-246-11739-7
12. Ben Gadri R 1997 Numerical simulation of an atmospheric pressure and dielectric barrier controlled glow discharge PhD Thesis Order 2644, University Paul Sabatier, Toulouse III, France
13. Ben Gadri R 1999 One atmosphere glow discharge structure revealed by computer modeling IEEE Trans. Plasma Sci. 27 36-7
14. Boenig H V 1988 Fundamentals of Plasma Chemistry and Technology (Lancaster, PA: Technomic) ISBN 87762-538-7
15. Boulos M, Fauchais P and Pfender E 1994 Thermal Plasma Processing vol I (New York: Plenum)
16. Cary H B 1979 Modern Welding Technology (Englewood Cliffs, NJ: Prentice-Hall) ISBN 0-13-599290-7
17. Cobine J D 1958 Gaseous Conductors (New York: Dover)
18. DeVries L 1959 German-English Science Dictionary 3rd edn (New York: McGraw-Hill) LCCCN 59-9412
19. Eliasson B and Kogelschatz U 1988 UV excimer radiation from dielectric-barrier discharges Appl. Phys. B 46 299-303
20. Gross B, Grycz B and Miklossy K 1969 Plasma Technology (New York: Elsevier) LCCCN 68-27535
21. Hoyaux M F 1968 Arc Physics (New York: Springer) LCCCN 68-24015
22. Kanazawa S, Kogoma M, Moriwaki T and Okazaki S 1988 Stable glow plasma at atmospheric pressure J. Phys. D: Appl. Phys. 21 838-40
23. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley) ISBN 0-471-00577-0
24. Lieberman M A, Selwyn G S and Tuszewski M 1996 Plasma generation for materials processing MRS Bull. 21 32-7
25. Loeb L B 1965 Electrical Coronas (Berkeley, CA: University of California Press) LCCCN 64-18642.
26. Massines F, Rabehi A, Decomps Ph, Ben Gadri R, Segur P and Mayoux C 1998 Mechanisms of a glow discharge at atmospheric pressure controlled by dielectric barrier J. Appl. Phys. 83 2950-7
27. Mitsuda Y, Yoshida T and Akashi K 1989 Development of a new microwave plasma torch and its application to diamond synthesis Rev. Sci. Instrum. 63 21-30
28. National Academy 1991 Plasma Processing of Materials: Scientific Opportunities and Technological Challenges (Washington, DC: National Academy Press) ISBN 0-309-04597-5
29. Paschkis V and Persson J 1960 Industrial Electric Furnaces and Applications 2nd edn (New York: Interscience) LCCCN 60-11028
30. Roth J R 1995 Industrial Plasma Engineering: Volume I, Principles (Bristol: Institute of Physics Publishing) ISBN 0-7503-0318-2
31. Roth J R 1997 Method and apparatus for covering bodies with a uniform glow discharge plasma and applications thereof US Patent 5,669,583
32. Roth J R 1999 Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure US Patent 5,938,854
33. Roth J R, Sherman D M and Wilkinson S P 1998 Boundary layer flow control with a one atmosphere uniform glow discharge plasma AIAA Paper 98-0328
34. Roth J R, Tsai P P and Liu C 1995a Steady-state, glow discharge plasma US Patent 5,387,842
35. Roth J R, Tsai P P, Liu C, Laroussi M and Spence P D 1995b One atmosphere, uniform glow discharge plasma US Patent 5,414,324
36. Schutze, Jeong J Y, Babayan S E, Park J, Selwyn G S and Hicks R F 1998 The atmospheric plasma jet: a review and comparison to other plasma sources IEEE Trans. Plasma Sci. 26 1685-94
37. Smith D L 1995 Thin-FilmDeposition: Principles and Practice (New York: McGraw-Hill) ISBN 0-07-058502-4
38. Smith RW and Novak R 1991 Advances and applications in US thermal spray technology I-Technology and Materials Powder Metall. Int. 23 147-55
39. Von Engle A, Seeliger R and Steenbeck M 1933 On the glow discharge at high pressure Z. Phys. 85 144-60
40. Yokoyama T, Kogoma M, Moriwaki T and Okazaki S 1990 The mechanism of the stabilization of glow plasma at atmospheric pressure J. Phys. D: Appl. Phys. 23 1125-8
41. Anonymous 1986 Board-cleaning technique using hollow cathode plasma discharge IBM Technical Disclosure Bull. 29 1848-50
42. Asmussen J 1989 Electron cyclotron resonance microwave discharges for etching and thinfilm deposition J. Vac. Sci. Technol. A 7 883-93
43. Batenin V M, Klimovskii I I, Lysov G V and Troitskii V N 1992 Superhigh Frequency Generators of Plasma (Boca Raton, FL: Chemical Rubber Company) ISBN 0-8493-9305-1
44. Ben Gadri R 1997 Numerical simulation of an atmospheric pressure and dielectric barrier controlled glow discharge PhD Thesis Order No 2644, University Paul Sabatier, Toulouse III, France
45. Ben Gadri R 1999 One atmosphere glow discharge structure revealed by computer modeling IEEE Trans. Plasma Sci. 27 36-7
46. Berry L A and Gorbatkin S M 1995 Permanent magnet electron cyclotron resonance plasma source with remote window J. Vac. Sci. Technol. A 13 343-8
47. Boenig H V 1988 Fundamentals of Plasma Chemistry and Technology (Lancaster, PA: Technomic) ISBN 87762-538-7
48. Claude R, Moisan M, Wertheimer M R and Zakrzewski Z 1987 Comparison of microwave and lower frequency discharges for plasma polymerization Plasma Chem. Plasma Process. 7 451-64
49. Cobine J D 1958 Gaseous Conductors (New York: Dover)
50. Dai F and Wu J C-H 1995 Self-consistent multidimensional electron kinetic analysis for inductively coupled plasma sources IEEE Trans. Plasma Sci. 23 563-72
51. Dusek V and Musil J 1990 Microwave plasmas in surface treatment technologies Czech. J. Phys. 40 1185-204
52. Gicquel A and Catherine Y 1991 Plasmas: sources of excited, dissociated and ionized species. Consequences for chemical vapor deposition (CVD) and for surface treatment J. Physique IV 1 C2 343-56
53. Godyak V A, Piejak R B and Alexandrovich BM 1991 Electrical characteristics of parallelplate RF discharges in argon IEEE Trans. Plasma Sci. 19 660-76
54. Gorbatkin S M, Berry L A and Roberto J B 1990 Behavior of Ar plasma formed in a mirror field electron cyclotron resonance microwave ion source J. Vac. Sci. Technol. A. 8 2893-9
55. Gorbatkin S M, Berry L A and Sawyers J 1992 Poly-Si etching using electron cyclotron resonance microwave plasma sources with multipole confinement J. Vac. Sci. Technol. A 10 1295-302
56. Herb G K 1989 Safety, health, and engineering considerations for plasma processing Plasma Etching ed DM Manos and D L Flamm (San Diego, CA: Academic) pp 425-70 ISBN 0-12-469370-9
57. Hershkowitz N, Ding J, Breun R A, Chen R T S, Meyer J and Quick A K 1996 Does high density-low pressure etching depend on the type of plasma source? Phys. Plasmas 3 2197-202
58. Hirsh M N and Oskam H J 1996 (ed) 1978 Gaseous Electronics; Vol I, Electrical Discharges (New York: Academic) ISBN 0-12-349701-9
59. Howatson A M 1976 An Introduction to Gas Discharges 2nd edn (Oxford: Pergamon) ISBN 0-08-020574-7
60. Inoue M and Nakamura S 1995 Charge separation in an electron cyclotron resonance plasma J. Vac. Sci. Technol. A 13 327-31
61. Kaufman H R 1961 An ion rocket with an electron-bombardment ion source NASA Technical Note TND-585
62. Kaufman H R 1963 The electron bombardment ion rocket Advanced Propulsion Concepts (Proc. 3rd Symp., October, 1962) vol 1 (New York: Gordon and Breach)
63. Kaufman H R 1965 Performance correlation for electron bombardment ion sources NASA Technical Note TND-3041
64. Kohl W H 1995 Handbook of Materials and Techniques for Vacuum Devices (Woodbury, NY: American Institute of Physics) ISBN 1-56396-387-6
65. Lafferty J M (ed) 1980 Vacuum Arcs-Theory and Application (New York: Wiley) ISBN 0-471-06506-4
66. Li M, Wu H-M and Chen Y 1995 Two-dimensional simulation of inductive plasma sources with self-consistent power deposition IEEE Trans.Plasma Sci. 23 558-62
67. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley) ISBN 0-471-00577-0
68. Lieberman M A, Selwyn G S and Tuszewski M 1996 Plasma generation for materials processing MRS Bull. 21 32-7
69. Mutsukura N, Fukasawa Y, Machi Y and Kubota T 1994 Diagnostics and control of radiofrequency glow discharge J. Vac. Sci. Technol. A 12 3126-30
70. Olthoff J K, Van Brunt R J, Radovanov S B, Rees J A and Surowiec R 1994 Kinetic-energy distributions of ions sampled from argon plasma in a parallel-plate, radio frequency reference cell J. Appl. Phys. 75 115-25
71. Raizer Y P, Schneider M N and Yatsenko N A 1995 Radio-Frequency Capacitive Discharges (Boca Raton, FL: Chemical Rubber Company) ISBN 0-8493-8644-6
72. Reinke P, Schelz S, Jacob W and Moller W 1992 Influence of a direct current bias on the energy of ions from an electron cyclotron resonance plasma J. Vac. Sci. Technol. A 10 434-8
73. Roth J R 1995 Industrial Plasma Engineering: Vol I-Principles (Bristol: Institute of Physics Publishing) ISBN 0-7503-0318-2
74. Smith D L 1995 Thin-FilmDeposition: Principles and Practice (New York: McGraw-Hill) ISBN 0-07-058502-4
75. Stevens J E, Sowa M J and Cecchi J L 1995 Helicon plasma source excited by a flat spiral coil J. Vac. Sci. Technol. A 13 2476-82
76. Tao W H, Prelas M A and Yasuda H K 1996 Spatial distributions of electron density and electron temperature in direct current glow discharges J. Vac. Sci. Technol. A 14 2113-21
77. Tsai C C, Berry L A, Gorbatkin S M, Hazelton H H, Roberto J B and Stirling W L 1990 Potential applications of an electron cyclotron resonance multicusp plasma source J. Vac. Sci. Technol. A 8 2900-3
78. Ventzek P L G, Grapperhaus M and Kushner M J 1994 Investigation of electron source and ion flux uniformity in high plasma density inductively coupled etching tools using two-dimensional modeling J. Vac. Sci. Technol. B 12 3118-37
79. Vossen J L and Kern W (ed) 1978 Thin Film Processes (New York: Academic) ISBN 0-12-728250-5
80. Wainman P N, Lieberman M A, Lichtenberg A J, Stewart R A and Lee C 1995 Characterization at different aspect ratios (radius/length) of a radio frequency inductively coupled plasma source J. Vac. Sci. Technol. A 13 2464-9
81. Waits R K 1978 Planer magnetron sputtering Thin Film Processes ed J L Vossen and W Kern (New York: Academic) ch II-4, pp 131-73 ISBN 0-12-728250-5
82. Asmussen J 1989 Electron cyclotron resonance microwave discharges for etching and thinfilm deposition J. Vac. Sci. Technol. A 7 883-93
83. Batenin V M, Klimovskii I I, Lysov G V and Troitskii V N 1992 Superhigh Frequency Generators of Plasma (Boca Raton, FL: Chemical Rubber Company) ISBN 0-8493-93 05-1.
84. Ben Gadri R 1997 Numerical simulation of an atmospheric pressure and dielectric barrier controlled glow discharge PhD Thesis Order No 2644, University Paul Sabatier, Toulouse III, France
85. Ben Gadri R 1999 One atmosphere glow discharge structure revealed by computer modeling IEEE Trans. Plasma Sci. 27 36-7
86. Boenig H V 1988 Fundamentals of Plasma Chemistry and Technology (Lancaster, PA: Technomic) ISBN 87762-538-7
87. Claude R, Moisan M, Wertheimer M R and Zakrzewski Z 1987 Comparison of microwave and lower frequency discharges for plasma polymerization Plasma Chem. Plasma Process. 7 451-64
88. Clark P J 1971 Sputtering apparatus US Patent 3,616,450
89. Coburn J W 1991 Surface processing with partially ionized plasma IEEE Trans. Plasma Sci. 19 1048-62
90. Conrad J R 1988 Method and apparatus for plasma source ion implantation US Patent 4,764,394
91. Corbani J F 1975 Cathode sputtering apparatus US Patent 3,878,085 d’Agostino R (ed) 1990 Plasma Deposition, Treatment, and Etching of Polymers (New York: Academic) ISBN 0-12-200430-2
92. Danilich M J and Marchant R E 1994 Plasma deposition of polymeric thin films J. Appl. Polym. Sci.: Applied Polymer Symp. vol 54 (New York: Wiley) CCC 0570-4898/94/010001-02
93. Deeds W E 1992 Charging apparatus for meltblown webs US Patent 5,122,048
94. Dusek V and Musil J 1990 Microwave plasmas in surface treatment technologies Czech. J. Phys. 40 1185-204
95. Eisenmenger-Sittner C, Beyerknecht R, Bergauer A, Bauer W and Betz G 1995 Angular distribution of sputtered neutrals in a post magnetron geometry: measurement and Monte Carlo simulation J. Vac. Sci. Technol. A 13 2435-43
96. Flinn J E (ed) 1971 Engineering, Chemistry, and Use of Plasma Reactors (New York: American Institute of Chemical Engineers) LCCCN 74-164050
97. Fraser D B 1978 The Sputter and S-Gun magnetrons Thin Film Processes ed J L Vossen and W Kern (New York: Academic) ISBN 0-12-728250-5, ch II-3, pp 115-29
98. Gross B, Grycz B and Miklossy K 1969 Plasma Technology (New York: Elsevier) LCCCN 68-27535
99. Grube W L and Gay J G 1978 High rate carburizing in a glow discharge methane plasma Metall. Trans. A 9 1421-9
100. Harper J M E 1978 Ion beam deposition Thin Film Processes ed J L Vossen and W Kern (New York: Academic) ch II-5, pp 175-206 ISBN 0-12-728250-5
101. Hollahan J R and Bell A T 1974 Techniques and Applications of Plasma Chemistry (New York: Wiley) ISBN 0-471-40628-7
102. Hollahan J R and Rosler R S 1978 Plasma deposition of organic thin films Thin Film Processes ed J L Vossen and W Kern (New York: Academic) ch IV-1 ISBN 0-12-728250-5
103. Kanazawa S, Kogoma M, Moriwaki T and Okazaki S 1988 Stable glow plasma at atmospheric pressure J. Phys. D: Appl. Phys. 21 838-40
104. Kaufman H R 1963 The Electron Bombardment Ion Rocket (Advanced Propulsion Concepts, 1) (Proc. 3rd Symp., October, 1962) (New York: Gordon and Breach)
105. Kaufman H R 1965 Performance correlation for electron bombardment ion sources NASA Technical Note TND-3041
106. Keebler P F 1990 A large volume microwave plasma facility for plasma ion implantation studies MS Thesis University of Tennessee, Knoxville
107. Keebler P F, Crowley J E and Roth J R 1989 A high-voltage switching circuit for rapid plasma ion implantation Proc. 1989 IEEE Int. Conf. on Plasma Science (May 22-24, Buffalo, NY) IEEE Catalog No 89 CH2760-7, p 149
108. Kohl W H 1995 Handbook of Materials and Techniques for Vacuum Devices (Woodbury, NY: American Institute of Physics) ISBN 1-56396-387-6
109. Leahy MF and Kaganowicz G 1987 Magnetically enhanced plasma deposition and etching Solid State Technol. 30 99-104
110. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley) ISBN 0-471-00577-0
111. Lieberman M A, Selwyn G S and Tuszewski M 1996 Plasma generation for materials processing MRS Bull. 21 32-7
112. Loeb L B 1965 Electrical Coronas (Berkeley, CA: University of California Press) LCCCN 64-18642
113. Madou M 1995 Fundamentals of Microfabrication (Boca Raton, FL: Chemical Rubber Company) ISBN 0-8493-9451-1
114. Manos D M and Flamm D L (ed) 1989 Plasma Etching (New York: Academic) ISBN 0-12-469370-9
115. Matossian J N 1994 Plasma ion implantation technology at Hughes Research Laboratories J. Vac. Sci. Technol. B 12 850-3
116. Montie T C, Kelly-Wintenberg K and Roth J R 2000 An overview of research using a one atmosphere uniform glow discharge plasma (OAUGDP) for sterilization of surfaces and materials IEEE Trans. Plasma Sci. 28 41-50
117. Mort J and Jansen F (ed) 1986 Plasma Deposited Thin Films (Boca Raton, FL: Chemical Rubber Company) ISBN 0-8493-5119-7
118. Okazaki S 1992 Private Communication
119. Penfold A S and Thornton J A 1975 Electrode type glow discharge apparatus US Patent 3,884,793
120. Raizer Y P, Schneider M N and Yatsenko N A 1995 Radio-Frequency Capacitive Discharges (Boca Raton, FL: Chemical Rubber Company) ISBN 0-8493-8644-6
121. Rakowski W 1989 Plasma modification of wool under industrial conditions Melliand Textilberichte 70 780-5
122. Roth J R 1995 Industrial Plasma Engineering: Volume I, Principles (Bristol: Institute of Physics Publishing) ISBN 0-7503-0318-2
123. Roth J R 1997 Method and apparatus for covering bodies with a uniform glow discharge plasma and applications thereof US Patent 5,669,583
124. Roth J R 1999 Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure US Patent 5,938,854
125. Roth J R, Sherman D M, Gadri R B, Karakaya F, Chen Z, Montie T C, Kelly-Wintenberg K and Tsai P P-Y 2000 A remote exposure reactor (RER) for plasma processing and sterilization by plasma active species at one atmosphere IEEE Trans. Plasma Sci. 28 56-63
126. Roth J R, Tsai P P and Liu C 1995a Steady-state, glow discharge plasma US Patent 5,387,842
127. Roth J R, Tsai P P, Liu C, Laroussi M and Spence P D 1995b One atmosphere, uniform glow discharge plasma US Patent 5,414,324
128. Smith D L 1995 Thin-FilmDeposition: Principles and Practice (New York: McGraw-Hill) ISBN 0-07-058502-4
129. Spence P D, Keebler P F, Freeland M S and Roth J R 1991 A large-volume, uniform unmagnetized microwave plasma facility (MPF) for industrial plasma-processing applications Proc. Workshop on Industrial Plasma Applications and Engineering Problems, 10th Int. Symp. on Plasma Chemistry (Bochum, August 10)
130. Tsai P P-Y and Wadsworth L C 1995 Electro-static charging of meltblown webs for highefficiency air filters Adv. Filtration Separation Technol. 9 473-91
131. Thornton J A and Penfold A S 1978 Cylindrical magnetron sputtering Thin Film Processes ed J L Vossen and W Kern (New York: Academic) ch II-2, pp 75-113 ISBN 0-12-728250-5
132. US Inc. 1989 Planar Magnetron Sputter Sources Sales literature on the US Gun II Von Engle A, Seeliger R and Steenback M 1933 On the glow discharge at high pressure Z. Phys. 85 144-60
133. Vossen J L and Cuomo J J 1978 Glow discharge sputter deposition Thin Film Processes ed J L Vossen and W Kern (New York: Academic) ch II-1, pp 11-73 ISBN 0-12-728250-5
134. Vossen J L and Kern W (ed) 1978 Thin Film Processes (New York: Academic) ISBN 0-12-728250-5
135. Waits R K 1978 Planer magnetron sputtering Thin Film Processes ed J L Vossen and W Kern (New York: Academic) ch II-4, pp 131-73 ISBN 0-12-728250-5
136. Waits R K 1997 Edison’s vacuum coating patents AVS Newsletter May/June, pp 18-19
137. Yasuda H 1978 Glow discharge polymerization Thin Film Processes ed J L Vossen and W Kern (New York: Academic) ch IV-2 ISBN 0-12-728250-5
138. Yasuda H 1985 Plasma Polymerization (Orlando, FL: Academic) ISBN 0-12-768760-2
139. Barnes M S, Keller J H, Forster J C, O’Nell J A and Coultas D K 1992 Transport of dust particles in glow-discharge plasmas Phys. Rev. Lett. 68 313-16
140. Clauser M U and Meyer R X 1964 Magnetohydrodynamic control systems US Patent 3,162,398
141. El-Khabiry S and Colver G M 1997 Drag reduction by DC corona discharge along an electrically conductive flat plate for small Reynolds number flow Phys. Fluids 9 587-99
142. Hill G A 1963 Ionized boundary layer fluid pumping system US Patent 3,095,163
143. I L, Juan W-T, Chiang C-H and Chu J H 1996 Microscopic particle motions in strongly coupled dusty plasmas Science 272 1626-8
144. Kohl W H 1995 Handbook of Materials and Techniques for Vacuum Devices (Woodbury, NY: American Institute of Physics) ISBN 1-56396-387-6
145. Leahy MF and Kaganowicz G 1987 Magnetically enhanced plasma deposition and etching Solid State Technol. 30 99-104
146. Malik M R, Weinstein L M and Hussani M Y 1983 Ion wind drag reduction AIAA Paper 83-0231
147. Roth J R 1986 Introduction to Fusion Energy (Charlottesville, VA: Ibis) ISBN 0-935005-07-2
148. Roth J R 1995 Industrial Plasma Engineering: Vol I—Principles (Bristol: Institute of Physics Publishing) ISBN 0-7503-0318-2
149. Roth J R 1997 Method and apparatus for covering bodies with a uniform glow discharge plasma and applications thereof US Patent 5,669,583
150. Roth J R 2001 Neutral gas flow induced by Lorentzian collisions at plasma boundaries and the possibility of operating fusion reactors at one atmosphere Current Trends in International Fusion Research-Proc. 3rd Symp. ed E Panarella (Ottawa: NRC Press) at press
151. Roth J R, Sherman D M and Wilkinson S P 1998 Boundary layer flow control with a one atmosphere uniform glow discharge AIAA Paper 98-0328, 36th AIAA Aerospace Sciences Meeting (Reno, NV)
152. Roth J R, Sherman D M and Wilkinson S P 2000 Electrodynamic flow control with a glow-discharge plasma AIAA J. 38 1166-72
153. Sherman D M 1998 Manipulating aerodynamic boundary layers using an electrohydrodynamic effect generated by a one atmosphere uniform glow discharge plasma MS Thesis Department of Physics, University of Tennessee, Knoxville, TN
154. Tsinober A 1989 MHD flow drag reduction Viscous Drag Reduction in Boundary Layers (AIAA Progress in Astronautics and Aeronautics, 123) ed A R Seabass, pp 327-49 ISBN 0-930403-66-5
155. Batenin V M, Klimovskii I I, Lysov G V and Troitskii V N 1992 Superhigh Frequency Generators of Plasma (Boca Raton, FL: Chemical Rubber Company) ISBN 0-8493-93 05-1
156. Bounasri F, Moisan M, Sauve G and Pelletier J 1993 Influence of the frequency of a periodic biasing voltage upon the etching of polymers J. Vac. Sci. Technol. B 11 1859-67
157. Coburn J W 1982 Plasma-assisted etching Plasma Chem. Plasma Process. 2 1-41
158. Coburn J W and Winters H F 1979 Plasma etching-a discussion of mechanisms J. Vac. Sci. Technol. 16 391-403
159. Coburn J W and Winters H F 1983 Plasma-assisted etching in microfabrication Annu. Rev. Mater. Sci. 13 91-116
160. Colgan M J, Kwon N, Li Y and Murnick D E 1991 Time- and space-resolved electronimpact excitation rates in an RF glow discharge Phys. Rev. Lett. 66 1858-61
161. Gerlach-Meyer U, Coburn J W and Key E 1981 Ion-enhanced gas-surface chemistry: the influence of the mass of the incident ion Surf. Sci. 103 177-88
162. Godyak V A, Piejak R B and Alexandrovich BM1991 Electrical characteristics of parallelplate RF discharges in argon IEEE Trans. Plasma Sci. 19 660-71
163. Hope D A D, Monnington G J, Gill S S, Borsing N, Smith J A and Rees J A 1993 Ion energy distributions in SiCl4 and Ar/O2 dry etching discharges Vacuum 44 245-8
164. Lee C and Lieberman M A 1995 Global model of Ar, O2, Cl, and Ar/O2 high-density plasma discharges J. Vac. Sci. Technol. A 13 368-80
165. Mayer T M and Barker R A 1982 Reactive ion beam etching with CF4: characterization of a Kaufman ion source and details of SiO2 etching J. Electrochem. Soc. 129 585-91
166. McDaniel E W 1964 Collision Phenomena in Ionized Gases (New York: Wiley) table 9.9.2, p 439 LCCCN 64-13219
167. Mutsukura N, Fukasawa Y, Machi Y and Kubota T 1994 Diagnostics and control of radiofrequency glow discharge J. Vac. Sci. Technol. A 12 3126-30
168. Olthoff J K, Van Brunt R J, Radovanov S B, Rees J A and Surowiec R 1994 Kinetic-energy distributions of ions sampled from argon plasma in a parallel-plate, radio frequency reference cell J. Appl. Phys. 75 115-25
169. Raizer Y P, Schneider M N and Yatsenko N A 1995 Radio-Frequency Capacitive Discharges (Boca Raton, FL: Chemical Rubber Company) ISBN 0-8493-8644-19
170. Reinke P, Schelz S, Jacob W and Moller W 1992 Influence of a direct current bias on the energy of ions from an electron cyclotron resonance plasma J. Vac. Sci. Technol. A 10 434-8
171. Roth J R 1995 Industrial Plasma Engineering: Vol. I-Principles (Bristol: Institute of Physics Publishing) ISBN 0-7503-0318-2
172. Vossen J L and Kern W (ed) (1978) Thin Film Processes (New York: Academic) ISBN 0-12-728250-5
173. Winters H F, Coburn J W and Chuang T J 1983 Surface processes in plasma-assisted etching environment J. Vac. Sci. Technol. B 1 469-80
174. Zheng J, Brinkmann R P and McVittie J P 1995 The effect of the presheath on the ion angular distribution at the wafer surface J. Vac. Sci. Technol. A 13 859-64
175. Barren B J, Green M J, Suez E I and Corn R M 1991 Polarization modulation Fourier transform infrared reflectance measurements of thin films and monolayers at metal surfaces utilizing real-time sampling electronics Anal. Chem. 63 55-60
176. Bohm C and Peril J 1993 Retarding-field analyzer for measurements of ion energy distributions and secondary electron emission coefficients in low-pressure radio frequency discharges Rev. Sci. Instrum. 64 31-44
177. Cali F A, Herbert P A F and Kelly WM 1995 Automated Langmuir probe characterization of methane/hydrogen low-pressure radio frequency discharges in a production reactor J. Vac. Sci. Technol. A 13 2920-3
178. Chatterton P A, Rees J A, Wu W L and Al-Assadi K 1991 A self-compensating Langmuir probe for use in RFD (13.56 MHz) plasma systems Vacuum 42 489-93
179. Deeds W E 1992 Charging apparatus for meltblown webs US Patent 5,122,048
180. Egitto F D and Matienzo L J 1994 Plasma modification of polymer surfaces for adhesion improvement IBM J. Res. Dev. 38 423-39
181. Frazier D A, Kolluri O S, Wagner G and Fahner A 1991 Successful TP Opainting-cold gas plasma advances painting application Himont/Plasma Science Technical Note 7/91
182. Green M J, Barren B J and Corn R M 1991 Real-time sampling electronics for double modulation experiments with Fourier transform infrared spectrometers Rev. Sci. Instrum. 62 1426-30
183. Hansen G P, Rushing R A, Warren R W, Kaplan S L and Kolluri O S 1989 Achieving optimum bond strength with plasma treatment Proc. SME Adhesives ‘89 (Atlanta, GA)
184. Hope D A D, Monnington G J, Gill S S, Borsing N, Smith J A. and Rees J A 1993 Ion energy distributions in SiCl4 and Ar/O2 dry etching discharges Vacuum 44 245-8
185. Hutchinson I H 1987 Principles of Plasma Diagnostics (New York: Cambridge University Press) ISBN 0-521-32622-2
186. Iwata H and Asakawa K 1991 Direct Observation of GaAs Surface Cleaning Process Under Hydrogen Radical Beam Irradiation INSPEC No B91076819 (AIP Conf. Proc. 227) (Clearwater, FL: Advanced Processing and Characterization Technologies) pp 122-5
187. Kaplan S L and Rose P W 1991 Plasma surface treatment of plastics to enhance adhesion Int. J. Adhesion Adhesives 11 109-13
188. Lochte-Holtgreven W 1995 Plasma Diagnostics (New York: American Institute of Physics) ISBN 1-56396-388-4
189. Manos D M and Flamm D L (ed) 1989 Plasma Etching (New York: Academic) ISBN 0-12-469370-9
190. Matieno L J, Emmi F and Johnson R W 1989 Electron spectroscopy Principles of Electronic Packaging ed D P Seraphim, R Lasky and C-Y Li (New York: McGraw-Hill) ch 24
191. Mutsukura N, Fukasawa Y, Machi Y and Kubota T 1994 Diagnostics and control of radiofrequency glow discharge J. Vac. Sci. Technol. A 12 3126-30
192. Olthoff J K, Van Brunt R J, Radovanov S B, Rees J A and Surowiec R 1994 Kinetic-energy distributions of ions sampled from argon plasma in a parallel-plate, radio frequency reference cell J. Appl. Phys. 75 115-25
193. Roth J R 1995 Industrial Plasma Engineering Vol I-Principles (Bristol: Institute of Physics Publishing) ISBN 0-7503-0318-2
194. Roth J R and Clark M 1969 Analysis of integrated charged particle energy spectra from gridded electrostatic analyzers Plasma Phys. 11 131-43
195. Smith D L 1995 Thin-FilmDeposition: Principles and Practice (New York: McGraw-Hill) ISBN 0-07-058502-4
196. Strobel M, Lyons C S and Mittal K L 1970 (ed) 1994 Plasma Surface Modification of Polymers: Relevance to Adhesion (Zeist: VSP) ISBN 90-6764-164-2
197. Swift J D and Schwar M J R 1970 Electrical Probes for Plasma Diagnostics (New York: Elsevier) ISBN 444-19694-3
198. Tira J S 1987 Adhesive and surface preparation evaluation for stainless steel used in electrical assemblies SAMPE J. 18 18-22
199. Tsai P P-Y and Wadsworth L C 1995 Electro-static charging of meltblown webs for highefficiency air filters Adv. Filtration Separation Technol. 9 473-91
200. Winters H F 1980 Elementary Processes at Solid Surfaces Immersed in Low Pressure Plasmas (Topics in Current Chemistry 94, Plasma Chemistry III) ed S Veprek and M Venugopalan (New York: Springer) pp 69-125 ISBN 0-387-10166-7
201. Zheng J, Brinkmann R P and McVittie J P 1995 The effect of the presheath on the ion angular distribution at the wafer surface J. Vac. Sci. Technol. A 13 859-64
202. Anonymous 1986 Board-cleaning technique using hollow cathode plasma discharge IBM Tech. Disclosure Bull. 29 1848-50
203. Ben Gadri R, Roth J R, Montie T C, Kelly-Wintenberg K, Tsai P P-Y, Helfritch D J, Feldman P, Sherman D M, Karakaya F and Chen Z 2000 Sterilization and plasma processing of room temperature surfaces with a one atmosphere uniform glow discharge plasma (OAUGDP) Surf. Coatings Technol. 131 528-42
204. Brickman C, Yu Y, Roth J R, Tsai P P-Y, Wadsworth L C, Montie T C and Kelly-Wintenberg K 1996 Room temperature sterilization of materials with a one atmosphere uniform glow discharge plasma Proc. 1996 Ann. Meeting (Research Triangle Park, NC: Society for Industrial Microbiology)
205. Carr A K 1997 Increase in the surface energy of metal and polymeric surfaces using the one atmosphere uniform glow discharge plasma MS in EE Thesis University of Tennessee
206. d’Agostino R (ed) 1990 Plasma Deposition, Treatment, and Etching of Polymers (New York: Academic) ISBN 0-12-200430-2
207. Egitto F D and Matienzo L J 1994 Plasma modification of polymer surfaces for adhesion improvement IBM J. Res. Dev. 38 423-39
208. Frazier D A, Kolluri O S, Wagner G and Fahner A 1991 Successful TP Opainting-cold gas plasma advances painting application Himont/Plasma Science Technical Note 7/91
209. Griesser H J 1989 Small scale reactor for plasma processing of moving substrate web Vacuum 39 485-8
210. Hansen G P, Rushing R A, Warren R W, Kaplan S L and Kolluri O S 1989 Achieving optimum bond strength with plasma treatment Proc. SME Adhesives ‘89 (Atlanta, GA)
211. Hermann H W, Henins I, Park J and Selwyn G S 1999 Decontamination of chemical and biological warfare (CBW) agents using an atmospheric pressure plasma jet (APPJ) Phys. Plasmas 6 2284-9
212. Hseuh H C, Chou T S and Christianson C A 1985 Glow discharge cleaning of stainless steel accelerator beam tubes J. Vac. Sci. Technol. A 3 518-22
213. Hudis M 1974 Plasma treatment of solid materials Techniques and Applications of Plasma Chemistry ed J R Hollahan and A T Bell (New York: Wiley) pp 113-47 ISBN 0-471-40628-7
214. Iwata H and Asakawa K 1991 Direct Observation of GaAs Surface Cleaning Process Under Hydrogen Radical Beam Irradiation INSPEC No B91076819 (AIP Conf. Proc. 227) (Clearwater, FL: Advanced Processing and Characterization Technologies) pp 122-5
215. Kaplan S L 1994 Private communication
216. Kaplan S L and Hansen W P 1991 Plasma-the environmentally safe treatment method to prepare plastics and composites for adhesive bonding and painting Proc. 1st Int. SAMPE Environmental Symp. (San Diego, CA)
217. Kaplan S L and Rose P W 1991 Plasma surface treatment of plastics to enhance adhesion Int. J. Adhesion Adhesives 11 109-13
218. Kelly-Wintenberg K, Hodge A, Montie T C, Deleanu L, Sherman D M, Roth J R, Tsai P P-Y and Wadsworth L C 1999 Use of a one atmosphere uniform glow discharge plasma (OAUGDP) to kill a broad spectrum of microorganisms J. Vac. Sci. Technol. A 17 1539-44
219. Kelly-Wintenberg K, Montie T C, Brickman C, Roth J R, Carr A K, Sorge K, Wadsworth L C and Tsai P P-Y 1998 Room temperature sterilization of surfaces and fabrics with a one atmosphere uniform glow discharge plasma J. Indust. Microbiol. Biotechnol. 20 69-74
220. Kelly-Wintenberg K, Sherman D M, Tsai P P-Y, Ben Gadri R, Karakaya F, Chen Z, Roth J R and Montie T C 2000 Air filter sterilization using a one atmosphere uniform glow discharge plasma (the Volfilter) IEEE Trans. Plasma Sci. 28 64-71
221. Kolluri O S, Kaplan S L and Rose P W 1988 Gas plasma and the treatment of advanced fibers Proc. SPE Advanced Polymer Composites ‘88 Tech. Conf. (Los Angeles, CA)
222. Korzec D, Rapp J, Theirich D and Engemann J 1994 Cleaning of metal parts in oxygen radio frequency plasma: process study J. Vac. Sci. Technol. A 12 369-78
223. Mlynko W E, Cain S R, Egitto F D and Emmi F 1988 Plasma processing Principles of Electronic Packaging ed D P Seraphim, R Lasky and C-Y Li (New York: McGraw-Hill) ch 14
224. Montie T C, Kelly-Wintenberg K and Roth J R 2000 An overview of research using a one atmosphere uniform glow discharge plasma (OAUGDP) for sterilization of surfaces and materials IEEE Trans. Plasma Sci. 28 41-50
225. Neusch M and Kieser J 1984 Surface activation of polymers in a microwave plasma Vacuum 34 959-61
226. O’Connell J P, Dunn T S, Rumaks A and Williams J L 1981 Detection of thrombus formation on intravascular catheters using 125I-fibrogen Thrombosis Res. 21 111-20
227. Ouellette R P, Barbier M M and Cheremisinoff P N (ed) 1980 Electrotechnology Volume 5 Low-Temperature Plasma Technology Applications (Ann Arbor, MI: Ann Arbor Science) ISBN 0-250-40375-7
228. Pavlath A E 1974 Plasma treatment of natural materials Techniques and Applications of Plasma Chemistry ed J R Hollahan and A T Bell (New York: Wiley) pp 149-75 ISBN 0-471-40628-7
229. Rakowski W 1989 Plasma modification of wool under industrial conditions Melliand Textilberichte 70 780-5
230. Ratner B D, Chilkoti A and Lopez G P 1990 Plasma deposition and treatment for biomaterial applications Plasma Deposition, Treatment, and Etching of Polymers ed R d’Agostino (Boston, MA: Academic) pp 463-516 ISBN 0-12-200430-2
231. Richley E A and Cybulski R J 1962 Experimental effects from cesium and mercury ion beams National Aeronautics and Space Administration Report NASA TND-1217
232. Roth J R 1995 Industrial Plasma Engineering: Vol I-Principles (Bristol: Institute of Physics Publishing) ISBN 0-7503-0318-2
233. Roth J R 1999 Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure US Patent 5,938,854
234. Roth J R, Chen Z, Sherman D M, Karakaya F, Tsai P P-Y, Kelly-Wintenberg K and Montie T C 2000a Increasing the surface energy and sterilization of non-woven fabrics by exposure to a one atmosphere uniform glow discharge plasma (OAUGDP) Proc. Int. Nonwovens Technical Conf. INTC-2000 (Dallas, TX)
235. Roth J R, Ku Y, Tsai P P-Y, Wadsworth L C, Sun Q, Montie T C and Kelly-Wintenberg K 1996 A study of the sterilization of nonwoven webs using one atmosphere glow discharge plasma Proc. 1996 TAPPI Conf. (NC) pp 225-30 ISBN 0-89852-658-2
236. Roth J R, Sherman DM, Ben Gadri R, Karakaya F, Chen Z, Montie T C, Kelly-Wintenberg K and Tsai P P-Y 2000b A remote exposure reactor (RER) for plasma processing and sterilization by plasma active species at one atmosphere IEEE Trans. Plasma Sci. 28 56-63
237. Roth J R, Tsai P P-Y, Liu C and Wadsworth L C 1995a Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure US Patent 5,456,972
238. Roth J R, Tsai P P-Y, Wadsworth L C, Liu C and Spence P D 1995b Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure US Patent 5,403,453
239. Rutala W A, Gergen M F and Weber D J 1998 Comparative evaluation of the sporicidal activity of new low-temperature sterilization technologies: ethylene oxide, 2 plasma sterilization systems, and liquid peracetic acid Am. J. Infect. Control 26 393-8
240. Strobel M, Lyons C S and Mittal K L (ed) 1994 Plasma Surface Modification of Polymers: Relevance to Adhesion (Zeist: VSP) ISBN 90-6764-164-2
241. Struckman C K and Kusse B R 1993 High-purity intense lithium-ion-beam sources using glow-discharge cleaning techniques J. Appl. Phys. 74 3658-68
242. Tira J S 1987 Adhesive and surface preparation evaluation for stainless steel used in electrical assemblies SAMPE J. 18 18-22
243. Tsai P P-Y and Wadsworth L C 1995 Electro-static charging of meltblown webs for highefficiency air filters Adv. Filtration Separation Technol. 9 473-91
244. Tsai P P-Y, Wadsworth L C and Roth J R 1997 Surface modification of fabrics using a one-atmosphere glow discharge plasma to improve fabric wettability Textile Res. J. 67 359-69
245. Tsai P P-Y, Wadsworth L C, Spence P D and Roth J R 1994 Surface modifications of nonwoven webs using one atmosphere glow discharge plasma to improve web wettability and other textile properties Proc. 4th Ann. TANDEC Conf. (Knoxville, TN)
246. Vassal S, Favennec L, Ballet J-J and Brasseur P 1998 Hydrogen peroxide gas plasma sterilization is effective against Cryptosporidium parvum oocysts Am. J. Infect. Control 26 136-8
247. Wadsworth L C, Roth J R, Tsai P P-Y and Spence P D 1994 Fiber surface modifications using one atmosphere glow discharge plasma Proc. 20th ACS National Meeting (San Diego, CA)
248. Williams J L, Dunn T S, O’Connell J P and Montgomery D 1986 Heparinization of plasma treated surfaces US Patent 4,613,517
249. Wilson R G and Brewer G R 1973 Ion Beams with Applications to Ion Implantation (New York: Wiley) ISBN 0-471-95000-9
250. Yasuda H K (ed) 1984 Plasma Polymerization and Plasma Treatment (J. Appl. Polymer Sci.: Appl. Polymer Symp. 38) (New York: Wiley)
251. Yasuda H K (ed) 1988 Plasma Polymerization and Plasma Treatment of Polymers (J. Appl. Polymer Sci.: Appl. Polymer Symp. 42) (New York: Wiley)
252. Yasuda H K (ed) 1990 Plasma Polymerization and Plasma Interactions with Polymeric Materials (J. Appl. Polymer Sci.: Appl. Polymer Symp. 46) (New York: Wiley)
253. Young J H 1997 New sterilization technologies Sterilization Technology for the Health Care Facility ed M Reichert and J H Young (Gaithersburg, MD: Aspen) ch 26, pp 228-35 ISBN 0-8342-0838-5
254. Amin A, Aossey D, Nguyen B T, Kim H-S, Cooney J L and Lonngren K E 1993 Sheath evolution in a negative ion plasma Phys. Fluids B 5 3813-18
255. Anders A, Anders S, Brown I G, Dickinson M R and MacGill R A 1994 Metal plasma immersion ion implantation and deposition using vacuum arc plasma sources J. Vac. Sci. Technol. B 12 815-20
256. Anonymous 1988 The Ion Implanter: a Newsletter for Ion Surface Technology Customers (Clawson, MI: Ion Surface Technology)
257. Anonymous 1989 Plasma Source Ion Implantation: PSII (Woburn, MA: Applied Science and Technology)
258. Bernius M T and Chutjian A 1989 High-voltage, full-floating 10 MHz square-wave generator with phase control Rev. Sci. Instrum. 60 779-82
259. Brown I G (ed) 1989 The Physics and Technology of Ion Sources (New York: Wiley) ISBN 0-471-85708-4
260. Buchanan R A, Lee I-S and Williams J M 1988 Iridium ion implantation of surgical titanium alloy: corrosion inhibition and charge injection effects Proc. ASM Conf. on Ion Implantation and Plasma-Assisted Processes for Industrial Applications (Atlanta, GA) ed R F Hochman, H Solnick-Legg and K O Legg (American Society for Materials) pp 53-6
261. Buecken B B 1978 Erzeugung verschleissfester schichten in einer stromstarken glimmentladung Technik 33 395-9
262. Calder A C, Hulbert GW and Laframboise J G 1993 Sheath dynamics of electrodes stepped to large negative potentials. Phys. Fluids B 5 674-90
263. Carter G and Grant W A 1976 Ion Implantation of Semiconductors (New York: Wiley) ISBN 0-470-15125-0
264. Chen A, Scheuer J T, Ritter C, Alexander R B and Conrad J R 1991 Comparison between conventional and plasma source ion-implanted femoral knee components J. Appl. Phys. 70 6757-60
265. Conrad J R 1988 Method and apparatus for plasma source ion implantation US Patent 4,764,394
266. Conrad J R, Dodd R A, Worzala F J, Qiu X and Post R S 1988 Plasma source ion implantation-a new, cost-effective, non-line-of-sight technique for ion implantation Proc. ASM Conf. on Ion Implantation and Plasma-Assisted Processes for Industrial Applications (Atlanta, GA) ed R F Hochman, H Solnick-Legg and K O Legg (American Society for Materials) pp 185-91
267. Dearnaley G, Freeman J H, Nelson R S and Stephen J 1973 Ion Implantation (New York: Elsevier) ISBN 0-444-10488-7
268. Grube W L and Gay J G 1978 High rate carburizing in a glow discharge methane plasma Metall. Trans. A 9 1421-9
269. Gupta A 1991 Corrosion inhibition through nitrogen implantation into aluminum by ion beam and plasma source ion implantation MS Thesis University of Tennessee at Knoxville, TN
270. Hollahan J R and Bell A T (ed) 1974 Techniques and Applications of Plasma Chemistry (New York: Wiley) ISBN 0-471-40628-7
271. Howes W L 1964 Effect of initial velocity on one-dimensional, bipolar, space-charge currents J. Appl. Phys. 36 2039-45 (see also NASA Technical Note TN D-2425)
272. Howes W L 1966a One-dimensional space-charge theory: I. Generalization J. Appl. Phys. 37 437-8
273. Howes W L 1966b One-dimensional space-charge theory: II. Relativistic Child law J. Appl. Phys. 37 438-9
274. Kamath S G 1994 Factors affecting the plasma ion implantation of metallic samples MS Thesis University of Tennessee at Knoxville, TN
275. Kamath S G and Roth J R 1993 Observation of sheath characteristics on a sample undergoing plasma ion implantation 1993 IEEE Int. Conf. on Plasma Science (Vancouver, BC) Conference Record, IEEE Catalog No 93CH3334-0, p 101
276. Keebler P F 1990 A large volume microwave plasma facility for plasma ion implantation studies MS Thesis Department of Electrical and Computer Engineering, University of Tennessee, Knoxville, TN
277. Keebler P F, Roth J R, Buchanan R A and Lee I-S 1989 Corrosion-related characteristics of plasma ion implanted samples exposed in a steady-state Penning discharge APS Bull. 34 2020-1
278. Malik S M, Fetherston R P, Sridharan K and Conrad J R 1993 Sheath dynamics and dose analysis for planar targets in plasma source ion implantation Plasma Sources Sci. Technol. 2 81-5
279. Matossian J N 1992 Private communication
280. Matossian J N 1994 Plasma ion implantation technology at Hughes Research Laboratories J. Vac. Sci. Technol. 12 850-3
281. Matossian J N and Goebel D M 1992 High voltage (100 kV), large scale (3 m3) plasma ion implantation (PII) facility 34th Ann. Meeting APS Division of Plasma Physics (Seattle, WA) post-deadline paper
282. Powell R A (ed) 1984 Dry Etching for Microelectronics (New York: Elsevier) ISBN 0-444-86905-0
283. Shamim M M, Scheuer J T, Fetherston R P and Conrad J R 1991 Measurement of electron emission due to energetic ion bombardment in plasma source ion implantation J. Appl. Phys. 70 4756-9
284. Shao J, Round M, Qin S and Chan C 1995 Dose-time relation in BF2 plasma immersion ion implantation J. Vac. Sci. Technol. A 13 332-4
285. Smith P P 1995 Ion implantation applications for pitting corrosion inhibition-(tungsten beam implantation of aluminum and nitrogen plasma ion implantation of 304L stainless steel) PhD Dissertation University of Tennessee, Knoxville, TN
286. Smith P P, Buchanan R A, Roth J R and Kamath S G 1994 Enhanced pitting corrosion resistance of 304L stainless steel by plasma ion implantation J. Vac. Sci. Technol. B 12 940-4
287. Spence P D, Keebler P F, Freeland M S and Roth J R 1991 A large-volume, uniform unmagnetized microwave plasma facility (MPF) for industrial plasma-processing applications Proc. Workshop on Industrial Plasma Applications and Engineering Problems, 10th Int. Symp. on Plasma Chemistry (Bochum)
288. Williams JM, Gonzales A, Quintana J, Lee I-S, Buchanan R A, Burns F C, Culbertson R J, Levy M and Treglio J R 1991 Ion implantation for corrosion inhibition of aluminum alloys in saline media Nucl. Instrum. Methods B 59/60 845-50
289. Wilson R G and Brewer G R 1973 Ion Beams, with Applications to Ion Implantation (New York: Wiley) ISBN 0-471-95000-9
290. Winters H F 1980 Elementary Processes at Solid Surfaces Immersed in Low Pressure Plasmas (Plasma Chemistry III) ed S Veprek and M Venugopalan (New York: Springer) ISBN 0-387-10166-7
291. Adams A C 1983 Plasma Deposition of Inorganic Films Solid State Technol. 26 135-9
292. Anonymous 1991 Plasma Processing of Materials: Scientific Opportunities and Technological Challenges (Washington, DC: National Academy Press) ISBN 0-309-04597-5
293. Arbab M 1997 Sputter-deposited low emissivity coatings on glass MRS Bull. 22 27-35
294. Clark P J 1971 Sputtering apparatus US Patent 3,616,450
295. Corbani J F 1975 Cathode sputtering apparatus US Patent 3,878,085
296. Eisenmenger-Sittner C, Beyerknecht R, Bergauer A, Bauer W and Betz G 1995 Angular distribution of sputtered neutrals in a post magnetron geometry: measurement and Monte Carlo simulation J. Vac. Sci. Technol. A 13 2435-43
297. Harper J M E 1978 Ion beam deposition Thin Film Processes ed J L Vossen and W Kern (New York: Academic) ch II-5, pp 175-206 ISBN 0-12-728250-5
298. Jansen F 1986 Plasma deposition processes Plasma Deposited Thin Films ed J Mort and F Jansen (Boca Raton, FL: Chemical Rubber Company) pp 1-19 ISBN 0-8493-5119-7
299. Kikuta K 1995 Aluminum reflow sputtering MRS Bull. 20 53-6
300. Molchanov V A and Tel’kovskii V G 1961 Variation of the cathode sputtering coefficient as a function of the angle of incidence of ions on a target Sov. Phys.-Dokl. 6 137-8
301. Mort J and Jansen F (ed) 1986 Plasma Deposited Thin Films (Boca Raton, FL: Chemical Rubber Company) ISBN 0-8493-5119-7
302. Ohba T 1995 Chemical-vapor-deposited tungsten for vertical wiring MRS Bull. 20 46-52
303. Pramanik D 1995 Aluminum-based metallurgy for global interconnects MRS Bull. 20 57-60
304. Roth J R 1995 Industrial Plasma Engineering: Vol I-Principles (Bristol: Institute of Physics Publishing) ISBN 0-7503-0318-2
305. Ryan J G, Brodsky S B, Katata T, Honda M, Shoda N and Aochi H 1995 Collimated sputtering of titanium and titanium nitride films MRS Bull. 20 42-5
306. Shaw J M 1993 Overview of polymer for electronic and photonic applications Polymer for Electronic and Photonic Applications ed C P Wong (San Diego, CA: Academic) pp 1-65 ISBN 0-12-762540-2
307. Smith D L 1995 Thin-FilmDeposition: Principles and Practice (New York: McGraw-Hill) ISBN 0-07-058502-4
308. US Inc. 1989 Planar Magnetron Sputter Sources sales literature on the US Gun II
309. Vossen J L and Cuomo J J 1978 Glow discharge sputter deposition Thin Film Processes ed J L Vossen and W Kern (New York: Academic) ch II-1, pp 11-73 ISBN 0-12-728250-5
310. Vossen J L and Kern W (ed) 1978 Thin Film Processes (New York: Academic) part II, chs 1-5, pp 11-206 ISBN 0-12-728250-5
311. Waits R K 1978 Planer magnetron sputtering Thin Film Processes ed J L Vossen and W Kern (New York: Academic) ch II-4, pp 131-73 ISBN 0-12-728250-5
312. Waits R K 1997 Edison’s vacuum coating patents AVS Newsletter May/June, pp 18-19
313. Weast R C (ed) 1988 Handbook of Chemistry and Physics 69th edn (Boca Raton, FL: Chemical Rubber Company)
314. Wilson R G and Brewer G R 1973 Ion beam sputtering Ion Beams-With Applications to Ion Implantation (New York: Wiley) ch 4, pp 317-52 ISBN 0-471-95000-9
315. Anonymous 1991 Plasma Processing of Materials: Scientific Opportunities and Technological Challenges (Washington, DC: National Academy Press) ISBN 0-309-04597-5
316. Asmussen J 1989 Electron cyclotron resonance microwave discharges for etching and thinfilm deposition J. Vac. Sci. Technol. A 7 883-93
317. Barnes M S, Keller J H, Forster J C, O’Nell J A and Coultas D K 1992 Transport of dust particles in glow-discharge plasmas Phys. Rev. Lett. 68 313-16
318. Bell A T 1980 The mechanism and kinetics of plasma polymerization Plasma Chemistry vol III, ed S Veprek and M Venugopalan (New York: Springer) pp 43-68 ISBN 0-387-10166-7
319. Claude R, Moisan M, Wertheimer M R and Zakrzewski Z 1987 Comparison of microwave and lower frequency discharges for plasma polymerization Plasma Chem. Plasma Process. 7 451-64
320. d’Agostino R (ed) 1990 Plasma Deposition, Treatment, and Etching of Polymers (New York: Academic) ISBN 0-12-200430-2
321. d’Agostino R, Camarossa F, Fracassi F and Illuzzi F 1990 Plasma polymerization of fluorocarbons Plasma Deposition, Treatment, and Etching of Polymers ed R d’Agostino (New York: Academic) ch 2, pp 95-162 ISBN 0-12-200430-2
322. Danilich M J and Marchant R E 1994 Plasma Deposition of Polymeric Thin Films (J. Appl. Polymer Sci.: Appl. Polymer Symp. 54) (New York: Wiley) CCC 0570-4898/94/010001-02
323. David M, Babu S V and Rasmussen D H 1990 RF plasma synthesis of amorphous AlN powder and films AIChE J. 36 871-6
324. Denaro A R, Owens P A and Crawshaw A 1968 Glow discharge polymerization-styrene Eur. Polymer J. 4 93-106
325. Donohoe K G and Wydeven T 1979 Plasma polymerization of ethylene in an atmospheric pressure-pulsed discharge J. Appl. Polymer Sci. 23 2591-601
326. Hollahan J R and Bell A T 1974 Techniques and Applications of Plasma Chemistry (New York: Wiley) ISBN 0-471-40628-7
327. Hollahan J R and Rosler R S 1978 Plasma deposition of organic thin films Thin Film Processes ed J L Vossen and W Kern (New York: Academic) ch IV-1 ISBN 0-12-728250-5
328. I L, Juan W-T, Chiang C-H and Chu J H 1996 Microscopic particle motions in strongly coupled dusty plasmas Science 272 1626-8
329. Kay E, Coburn J and Dolks A 1980 Plasma chemistry of fluorocarbons as related to plasma etching and plasma polymerization Plasma Chemistry vol III, ed S Veprek and M Venugopalan (New York: Springer) pp 1-42 ISBN 0-387-10166-7
330. Kobayashi H, Shen M and Bell A T 1974 Effects of reaction conditions on the plasma polymerization of ethylene J. Macromol. Sci. A 8 373-91
331. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley) ISBN 0-471-00577-0
332. Morita S, Bell A T and Shen M 1979 The effect of frequency on the plasma polymerization of ethane J. Polymer Sci.: Polymer Chem. Edition 17 2775-82
333. Morita S and Hattori S 1990 Applications of plasma polymers Plasma Deposition, Treatment, and Etching of Polymers ed R d’Agostino (New York: Academic) ch 6, pp 423-61 ISBN 0-12-200430-2
334. Morosoff N 1990 An introduction to plasma polymerization Plasma Deposition, Treatment, and Etching of Polymers ed R d’Agostino (New York: Academic) ch 1, pp 1-93 ISBN 0-12-200430-2
335. Mort J and Jansen F (ed) 1986 Plasma Deposited Thin Films (Boca Raton, FL: Chemical Rubber Company) ISBN 0-8493-5119-7
336. Poll H-U, Arzt M and Wickleder K-H 1976 Reaction kinetics in the polymerization of thin films on the electrodes of a glow-discharge gap Eur. Polymer J. 12 505-12
337. Raizer Y P, Shneider MN and Yatsenko N A 1995 Radio-Frequency Capacitive Discharges (Boca Raton, FL: Chemical Rubber Company) ISBN 0-8493-8644-6
338. Ratner B D, Chilkoti A and Lopez G P 1990 Plasma deposition and treatment for biomaterial applications Plasma Deposition, Treatment, and Etching of Polymers ed R d’Agostino (New York: Academic) ch 7, pp 463-516 ISBN 0-12-200430-2
339. Rose P W, Kolluri O S and Cormia R D 1989 Continuous plasma polymerization onto carbon fiber Proc. 34th Int. SAMPE Symp. (Reno, NV)
340. Roth J R 1995 Industrial Plasma Engineering Vol. I: Principles (Bristol: Institute of Physics Publishing) ISBN 0-7503-0318-2
341. Roth J R, Tsai P P and Liu C 1995a Steady-state, glow discharge plasma US Patent 5,387,842
342. Roth J R, Tsai P P, Liu C, Laroussi M and Spence P D 1995b One atmosphere, uniform glow discharge plasma US Patent 5,414,324
343. Shen MAnd Bell A T 1979 Plasma Polymerization (Washington, DC: American Chemical Society) ISBN 0-8412-0510-8
344. Smith D L 1995 Thin-FilmDeposition: Principles and Practice (New York: McGraw-Hill) ISBN 0-07-058502-4
345. Tibbitt J M, Shen M and Bell A T 1976 Structural characterization of plasma-polymerized hydrocarbons J. Macromol. Sci. A 10 1623-48
346. Veprek S and Venugopalan M (ed) 1980 Plasma Chemistry vol III (New York: Springer) ISBN 0-387-10166-7
347. Veprek-Heijman M G J and Boutard D 1991 The hydrogen content and properties of SiO2 films deposited from tetraethoxysilane at 27 MHz in various gas mixtures J. Electrochem. Soc. 138 2042-6
348. Vinzant J W, Shen M and Bell A T 1979 Polymerization of hydrocarbons in a pulsed plasma Plasma Polymerization ed M Shen and A T Bell (Washington, DC: American Chemical Society) ch 5, pp 79-85 ISBN 0-8412-0510-8
349. Wrobel A M and Wertheimer M R 1990 Plasma-polymerized organosilicones and organometallics Plasma Deposition, Treatment, and Etching of Polymers ed R d’Agostino (New York: Academic) ch 3, pp 163-268 ISBN 0-12-200430-2
350. Yasuda H 1978 Glow discharge polymerization Thin Film Processes ed J Vossen and W Kern (New York: Academic) ch IV-2 ISBN 0-12-728250-5
351. Yasuda H 1985 Plasma Polymerization (Orlando, FL: Academic) ISBN 0-12-768760-2
352. Bardeen J and Brattain W H 1948 The transistor, a semi-conductor triode Phys. Rev. 74 230-1
353. Barnes M S, Keller J H, Forster J C, O’Nell J A and Coultas D K 1992 Transport of dust particles in glow-discharge plasmas Phys. Rev. Lett. 68 313-16
354. Bounasri F, Moisan M, Sauve G and Pelletier J 1993 Influence of the frequency of a periodic biasing voltage upon the etching of polymers J. Vac. Sci. Technol. B 11 1859-67
355. Brattain W H and Bardeen J 1948 Nature of the forward current in germanium point contacts Phys. Rev. 74 231-2
356. Coburn J W 1982 Plasma-assisted etching Plasma Chem. Plasma Process. 2 1-41
357. Coburn J W and Winters H F 1979a Ion-and electron-assisted gas-surface chemistry-an important effect in plasma etching J. Appl. Phys. 50 3189-96
358. Coburn J W and Winters H F 1979b Plasma etching-a discussion of mechanisms J. Vac. Sci. Technol. 16 391-403
359. Coburn J W and Winters H F 1983 Plasma-assisted etching in microfabrication Annu. Rev. Mater. Sci. 13 91-116
360. Deshmukh V G I and Cox T I 1988 Physical characterization of dry etching plasmas used in semiconductor fabrication Plasma Phys. Control. Fusion 30 21-33
361. Garrity M P, Peterson T W and O’Hanlon J F 1996 Particle formation rates in sulfur hexafluoride plasma etching of silicon J. Vac. Sci. Technol. A 14 550-5
362. Geis M W, Lincoln G A, Efremow N and Piacentini W J 1981 A novel anisotropic dry etching technique J. Vac. Sci. Technol. 19 1390-3
363. Gerlach-Meyer U, Coburn J W and Key E 1981 Ion-enhanced gas-surface chemistry: the influence of the mass of the incident ion Surf. Sci. 103 177-88
364. Herb G K 1989 Safety, health, and engineering considerations for plasma processing Plasma Etching ed D M Manos and D L Flamn (San Diego, CA: Academic) pp 425-70 ISBN 0-12-469370-9
365. Hershkowitz N, Ding J, Breun R A, Chen R T S, Meyer J and Quick A K 1996 Does high density-low pressure etching depend on the type of plasma source? Phys. Plasmas 3 2197-202
366. Hollahan J R and Bell A T (ed) 1974 Techniques and Applications of Plasma Chemistry (New York: Wiley) ISBN 0-471-40628-7
367. Hope D A D, Monnington G J, Gill S S, Borsing N, Smith J A and Rees J A 1993 Ion energy distributions in SiCl4 and Ar/O2 dry etching discharges Vacuum 44 245-8
368. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley) ISBN 0-471-00577-0
369. Madou M 1995 Fundamentals of Microfabrication (Boca Raton, FL: Chemical Rubber Company) ISBN 0-8493-9451-1
370. Manos D M and Flamm D L (ed) 1989 Plasma Etching (New York: Academic) ISBN 0-12-469370-9
371. Mayer T M and Barker R A 1982 Reactive ion beam etching with CF4-characterization of a Kaufman ion source and details of SiO2 etching J. Electrochem. Soc. 129 585-91
372. Melliar-Smith C M and Mogab C J 1978 Plasma-assisted etching techniques for pattern delineation Thin Film Processes ed J L Vossen and W Kern (New York: Academic) ISBN 0-12-728250-5
373. Mogab C J, Adams A C and Flamm D L 1978 Plasma etching of Si and SiO2-the effect of oxygen additions to CF4 plasmas J. Appl. Phys. 49 3796-803
374. Morgan R A 1985 Plasma Etching in Semiconductor Fabrication (New York: Elsevier) ISBN 0-444-42419-9
375. Olthoff J K, Van Brunt R J, Radovanov S B, Rees J A and Surowiec R 1994 Kinetic-energy distributions of ions sampled from argon plasma in a parallel-plate, radio frequency reference cell J. Appl. Phys. 75 115-25
376. Perry T S 1993 Coming clean IEEE Spectrum 30 20-6
377. Powell R A (ed) 1984 Dry Etching for Microelectronics (New York: Elsevier) ISBN 0-444-86905-0
378. Powell R A and Downey D F 1984 Reactive ion-beam etching Dry Etching for Microelectronics ed R A Powell (Amsterdam: North-Holland) ch 4 ISBN 0-444-86905-0
379. Reid T R 1984 The Chip (New York: Simon and Schuster) ISBN 0-671-45393-9
380. Reinke P, Schelz S, Jacob W and Moller W 1992 Influence of a direct current bias on the energy of ions from an electron cyclotron resonance plasma J. Vac. Sci. Technol. A 10 434-8
381. Sugano T (ed) 1985 Applications of Plasma Processes to VLSI Technology (New York: Wiley) ISBN 0-471-86960-0
382. Tobey A C 1985 Semiconductor microlithography through the eighties Microelectron. Manufact. Test. 19
383. Ugajin R, Ishibashi A and Mori Y 1994 Advanced fabrication techniques of threedimensional microstructures for future electronic devices J. Vac. Sci. Technol. B 12 3160-5
384. Vossen J L and Kern W (ed) 1978 Thin Film Processes (New York: Academic) ISBN 0-12-728250-5
385. Winters H F, Coburn J W and Chuang T J 1983 Surface processes in plasma-assisted etching environment J. Vac. Sci. Technol. B 1 469-80
386. Zheng J, Brinkmann R P and McVittie J P 1995 The effect of the presheath on the ion angular distribution at the wafer surface J. Vac. Sci. Technol. A 13 859-64