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Physical Review Letters

Volumn 86, Issue 24, 2001, Pages 5502-5505

Nonlocal power deposition in inductively coupled plasmas

(2) Evans, J D a Chen, F F a

a Department of Civil and Environmental Engineering (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRON ENERGY LEVELS; EQUATIONS OF MOTION; IONIZATION; MAGNETIC FIELD EFFECTS; MATHEMATICAL MODELS; PLASMA DENSITY; PLASMA SHEATHS; PLASMA SOURCES; PROBABILITY; PROBES; TEMPERATURE;

ELECTRON TEMPERATURE; IONIZING ELECTRONS; LANGMUIR PROBE; NONLOCAL POWER DEPOSITION; RADIOFREQUENCY PLASMA;

INDUCTIVELY COUPLED PLASMA;

EID: 0035844602 PISSN: 00319007 EISSN: None Source Type: Journal
DOI: 10.1103/PhysRevLett.86.5502 Document Type: Article

Times cited : (25)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.