Predictions of ion energy distributions and radical fluxes in radio frequency biased inductively coupled plasma etching reactors

Journal of Applied Physics

Volumn 79, Issue 5, 1996, Pages 2275-2286

  Hoekstra, Robert J ^a   Kushner, Mark J ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001369474     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361152     Document Type: Article

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