Atom lithography with a holographic light mask

Physical Review Letters

Volumn 88, Issue 8, 2002, Pages

  Mutzel M ^a   Tandler, S ^a   Haubrich, D ^a   Meschede, D ^a  

^a INSTITUT FÜR ANGEWANDTE PHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC BEAMS; CRYSTAL GROWTH; DEPOSITION; HOLOGRAPHIC OPTICAL ELEMENTS; HOLOGRAPHY; LASER BEAMS; LITHOGRAPHY; PHOTOREFRACTIVE MATERIALS; SEMICONDUCTING SILICON; SUBSTRATES; THREE DIMENSIONAL;

ATOM LITHOGRAPHY; HOLOGRAPHIC LIGHT MASK; LATERAL INTENSITY DISTRIBUTION; NONPERIODIC PATTERN; PERIODIC PATTERN; PHOTOREFRACTIVE CRYSTAL; STANDING LIGHT WAVE FIELD;

ATOMIC PHYSICS;

EID: 0037170173     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (15)