Nanolithography with metastabile helium

Applied Physics B: Lasers and Optics

Volumn 63, Issue 2, 1996, Pages 203-205

  Nowak, S ^a   Pfau, T ^a   Mlynek, J ^a  

^a UNIVERSITY OF KONSTANZ   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC BEAMS; ELECTRONS; ETCHING; EVAPORATION; HELIUM; IONIZATION; MOLECULES; MONOLAYERS; WETTING;

DODECANETHIOLE MOLECULES; METASTABLE HELIUM ATOM; NANOLITHOGRAPHY; PENNING IONIZATION; SELF ASSEMBLING MONOLAYER; WRITING MECHANISM;

LITHOGRAPHY;

EID: 0030212269     PISSN: 09462171     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF01095274     Document Type: Article

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