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Volumn 16, Issue 6, 1998, Pages 3864-3873

Electron beam and scanning probe lithography: A comparison

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EID: 11744339064     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590425     Document Type: Article
Times cited : (92)

References (12)
  • 2
    • 0001646713 scopus 로고    scopus 로고
    • K. Wilder, H. T. Soh, A. Atalar, and C. F. Quate, J. Vac. Sci. Technol. B 15 1811 (1997). See also H. Sugimura and N. Nakagiri, Nanotechnology 8, A15 (1997). See also M. Ishibashi, S. Heike, H. Kajiyama, Y. Wada, and T. Hashizume, Appl. Phys. Lett. 72, 1581 (1998).
    • (1997) J. Vac. Sci. Technol. B , vol.15 , pp. 1811
    • Wilder, K.1    Soh, H.T.2    Atalar, A.3    Quate, C.F.4
  • 3
    • 0031234283 scopus 로고    scopus 로고
    • K. Wilder, H. T. Soh, A. Atalar, and C. F. Quate, J. Vac. Sci. Technol. B 15 1811 (1997). See also H. Sugimura and N. Nakagiri, Nanotechnology 8, A15 (1997). See also M. Ishibashi, S. Heike, H. Kajiyama, Y. Wada, and T. Hashizume, Appl. Phys. Lett. 72, 1581 (1998).
    • (1997) Nanotechnology , vol.8
    • Sugimura, H.1    Nakagiri, N.2
  • 4
    • 0032027868 scopus 로고    scopus 로고
    • K. Wilder, H. T. Soh, A. Atalar, and C. F. Quate, J. Vac. Sci. Technol. B 15 1811 (1997). See also H. Sugimura and N. Nakagiri, Nanotechnology 8, A15 (1997). See also M. Ishibashi, S. Heike, H. Kajiyama, Y. Wada, and T. Hashizume, Appl. Phys. Lett. 72, 1581 (1998).
    • (1998) Appl. Phys. Lett. , vol.72 , pp. 1581
    • Ishibashi, M.1    Heike, S.2    Kajiyama, H.3    Wada, Y.4    Hashizume, T.5
  • 5
    • 11744379311 scopus 로고    scopus 로고
    • PMMA molecular weight 950 000 amu
    • PMMA molecular weight 950 000 amu.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.