Electron beam and scanning probe lithography: A comparison

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3864-3873

  Wilder, Kathryn ^a   Quate, Calvin F ^a   Singh, Bhanwar ^b   Kyser, David F ^b  

^a STANFORD UNIVERSITY   (United States)

^b ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11744339064     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590425     Document Type: Article

References (12)

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3. K. Wilder, H. T. Soh, A. Atalar, and C. F. Quate, J. Vac. Sci. Technol. B 15 1811 (1997). See also H. Sugimura and N. Nakagiri, Nanotechnology 8, A15 (1997). See also M. Ishibashi, S. Heike, H. Kajiyama, Y. Wada, and T. Hashizume, Appl. Phys. Lett. 72, 1581 (1998).
4. K. Wilder, H. T. Soh, A. Atalar, and C. F. Quate, J. Vac. Sci. Technol. B 15 1811 (1997). See also H. Sugimura and N. Nakagiri, Nanotechnology 8, A15 (1997). See also M. Ishibashi, S. Heike, H. Kajiyama, Y. Wada, and T. Hashizume, Appl. Phys. Lett. 72, 1581 (1998).
5. PMMA molecular weight 950 000 amu.
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