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Volumn 71, Issue 9, 1997, Pages 1261-1263

Nanostructure fabrication in silicon using cesium to pattern a self-assembled monolayer

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000585603     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119867     Document Type: Article
Times cited : (61)

References (24)
  • 1
    • 0000224370 scopus 로고
    • and references therein
    • For a review of atomic optics and optical forces, see C. S. Adams, M. Sigel, and J. Mlynek, Phys. Rep. 240, 143 (1994) and references therein.
    • (1994) Phys. Rep. , vol.240 , pp. 143
    • Adams, C.S.1    Sigel, M.2    Mlynek, J.3
  • 18
    • 85033283802 scopus 로고    scopus 로고
    • unpublished results
    • Sodium atoms have been used to pattern a SAM resist of hexadecanethiolate on a gold substrate. The pattern was subsequently transferred into the gold using a wet-chemical etch. H. Robinson, K. K. Berggren, H. Biebuyck, M. Prentiss, and G. M. Whitesides (unpublished results).
    • Robinson, H.1    Berggren, K.K.2    Biebuyck, H.3    Prentiss, M.4    Whitesides, G.M.5
  • 24
    • 85033286508 scopus 로고    scopus 로고
    • San Jose, CA
    • A pattern formed by passing a cesium beam through a standing wave of light has been deposited on a SAM formed on gold. D. Meschede, presented at the Atom Optics conference at Optoelectronics '97, San Jose, CA, 1997.
    • (1997) Atom Optics Conference at Optoelectronics '97
    • Meschede, D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.