Level-specific lithography optimization for 1-Gb DRAM

IEEE Transactions on Semiconductor Manufacturing

Volumn 13, Issue 1, 2000, Pages 76-87

  Wong, Alfred K ^a,b   Ferguson, Richard ^a,b   Mansfield, Scott ^b   Molless, Antoinette ^b   Samuels, Donald ^b   Schuster, Ralf ^c   Thomas, Alan ^b  

^a IEEE

^b IBM RESEARCH   (United States)

^c Semiconductor300   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; MASKS; OPTICAL RESOLVING POWER; PHOTORESISTS;

OPTICAL RESOLUTION ENHANCEMENT;

DYNAMIC RANDOM ACCESS STORAGE;

EID: 0033879731     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.827347     Document Type: Article

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