Wavefront engineering from 500 nm to 100 nm CD

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3048, Issue , 1997, Pages 2-13

  Levenson, Marc D ^a,b  

^a RICE UNIVERSITY   (United States)

^b Enterprise Consulting   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER AIDED DESIGN; IMAGING TECHNIQUES; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE; WAVEMETERS; DISTANCE MEASUREMENT; LENSES; MASKS; OPTIMIZATION; PHASE SHIFT; TECHNOLOGY; WAVEFRONTS;

CRITICAL DIMENSION; ENGINEERING TECHNIQUES; OFF AXIS ILLUMINATION; OPTICAL PROXIMITY CORRECTIONS; PHASE-SHIFTING MASK; SEMICONDUCTOR INDUSTRY; SHORTER WAVELENGTH; TRADITIONAL APPROACHES;

WAVEFRONTS; PHOTOLITHOGRAPHY;

CRITICAL DIMENSIONS; OPTICAL MICROLITHOGRAPHY;

EID: 0031353277     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.275781     Document Type: Conference Paper

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