Process latitude and CD bias evaluation of attenuated PSM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 257-265

  Schmidt, Regina T ^a   Spence, Christopher A ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INSPECTION; MAPPING; MASKS; OPTIMIZATION; PRINTING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE;

CRITICAL DIMENSIONS; OPTICAL MICROLITHOGRAPHY; PROCESS LATITUDE;

PHOTOLITHOGRAPHY;

EID: 0031340411     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.275971     Document Type: Conference Paper

References (3)