Lithographic performance of an environmentally stable chemically amplified photoresist (ESCAP)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 34-60

  Conley, Willard E ^a   Breyta, Gregory ^a   Brunsvold, William R ^a   DiPietro, Richard A ^a   Hofer, Donald C ^a   Holmes, Steven J ^a   Ito, Hiroshi ^a   Nunes, Ron ^a   Fichtl, Gabrielle ^a   Hagerty, Peter ^a   Thackeray, James W ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ENVIRONMENTAL IMPACT; LOGIC DEVICES; PERFORMANCE; PHOTOLITHOGRAPHY; RANDOM ACCESS STORAGE; STABILITY; SUBSTRATES; TECHNOLOGY;

CHEMICALLY AMPLIFIED RESISTS; GLASS TRANSITION TEMPERATURES;

PHOTORESISTS;

EID: 0029748992     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.241840     Document Type: Conference Paper

References (19)