Rigorous three-dimensional photoresist exposure and development simulation over nonplanar topography

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems

Volumn 16, Issue 12, 1997, Pages 1431-1438

  Kirchauer, Heinrich ^a   Selberherr, Siegfried ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Nonplanar topography; Photo lithography; Resist development; Resist exposure; Rigorous electromagnetic scattering; Three dimensional simulation

Indexed keywords

COMPUTER SIMULATION; FLOWCHARTING; LIGHT SCATTERING; MASKS; MATHEMATICAL MODELS; PHOTORESISTS;

EXPOSURE;

PHOTOLITHOGRAPHY;

EID: 0031349516     PISSN: 02780070     EISSN: None     Source Type: Journal    
DOI: 10.1109/43.664225     Document Type: Article

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