0.15 μm KrF lithography for 1 Gb DRAM product using highly printable patterns and thin resist process

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1998, Pages 84-85

  Ozaki, T ^a   Azuma, T ^a   Itoh, M ^a   Kawamura, D ^a   Tanaka, S ^a   Ishibashi, Y ^a   Shiratake, S ^a   Kyoh, S ^a   Kondoh, T ^a   Inoue, S ^a   Tsuchida, K ^a   Kohyama, Y ^a   Onishi, Y ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; PHOTORESISTS; REACTIVE ION ETCHING;

LASER STEPPERS;

DYNAMIC RANDOM ACCESS STORAGE;

EID: 0031630377     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)