Effect of variable sigma aperture on lens distortion and its pattern size dependence

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2725, Issue , 1996, Pages 414-423

  Saito, Takashi ^a   Watanabe, Hisashi ^a   Okuda, Yoshimitsu ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

LENS DISTORTIONS; OVERLAY METROLOGY; SIGMA APERTURES;

COMPUTER SIMULATION; DISTANCE MEASUREMENT; LENSES; MICROMETERS;

PHOTOLITHOGRAPHY;

EID: 0029748679     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)