Micrascan III, 0.25 μm resolution step and scan system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2726, Issue , 1996, Pages 780-786

  Williamson, David ^a   McClay, James ^a   Andresen, Keith ^a   Gallatin, Gregg ^a   Himel, Marc ^a   Ivaldi, Jorge ^a   Mason, Chip ^a   McCullough, Andrew ^a   Otis, Charles ^a   Shamaly, John ^a   Tomczyk, Carol ^a  

^a SVG Lithography Systems Inc   (United States)

Author keywords

Catadioptric; Microlithography; Optical; Step and Scan

Indexed keywords

ABERRATIONS; OPTICAL RESOLVING POWER; PROJECTION SYSTEMS; SCANNING;

ILLUMINATING SYSTEMS; PROJECTION OPTICS;

PHOTOLITHOGRAPHY;

EID: 20244380913     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240939     Document Type: Conference Paper

References (6)

1. Optical/laser microlithography II
2. Annular field systems and the future of optical microlithography
3. Catadioptric microlithographic reduction lenses
4. 0.25-μm lithography using 248-nm step-and-scan technology
5. Vector diffraction analysis of phase-mask imaging in photoresist films