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Volumn 39, Issue 6, 1996, Pages
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Simple models for resist processing effects
a
a
IBM
(United States)
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Author keywords
[No Author keywords available]
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Indexed keywords
APPROXIMATION THEORY;
COMPUTATIONAL COMPLEXITY;
COMPUTATIONAL METHODS;
COMPUTER AIDED ANALYSIS;
COMPUTER SIMULATION;
DIFFUSION;
IMAGE ANALYSIS;
LITHOGRAPHY;
MATHEMATICAL MODELS;
FICKIAN DIFFUSION;
IMAGE PROFILE;
LINEWIDTHS;
RESIST PROCESSING EFFECTS;
THRESHOLD MODEL;
PHOTORESISTS;
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EID: 0030174038
PISSN: 0038111X
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Article |
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Times cited : (3)
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References (11)
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