KrF step and scan exposure system using higher N.A. projection lens

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2726, Issue , 1996, Pages 767-779

  Suzuki, Kazuaki ^a   Wakamoto, Shinji ^a   Nishi, Kenji ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

DUV; E D diagram; Excimer laser; KrF; Lithography; Scanning exposure; Step and scan; Vibration tolerance

Indexed keywords

COHERENT LIGHT; DYNAMIC RANDOM ACCESS STORAGE; EXCIMER LASERS; LITHOGRAPHY; MICROPROCESSOR CHIPS; PROJECTION SYSTEMS; SCANNING;

NUMERICAL APERTURE (NA); PROJECTION LENS;

OPTICAL INSTRUMENT LENSES;

EID: 0030316295     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240938     Document Type: Conference Paper

References (10)

1. Optical exposure system - Today and future
2. The paths to subhalf-micrometer optical lithography
3. Step and scan: The maturing technology
4. Advances in excimer laser lithography
5. The 193-nm full-field step-and-scan prototype at MIT Lincoln laboratory
6. Laser step alignment for a wafer stepper
7. New alignment sensors for wafer stepper
8. Vibration tolerance in optical imaging
9. Simulation on step & scan optical lithography
10. Dosage control for scanning exposure with pulsed energy fluctuation and exposed position jitter