Advances in process matching for rules-based optical proximity correction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2884, Issue , 1996, Pages 425-434

  Otto, Oberdan W ^a   Henderson, Richard C ^a  

^a Trans Vector Technologies   (United States)

Author keywords

Optical enhancement; Optical lithography; Optical proximity correction; Process modeling

Indexed keywords

PHOTOLITHOGRAPHY; PROCESS MONITORING; TABLE LOOKUP;

IN PROCESSES; LOOK-UP TABLES; OPTICAL ENHANCEMENT; OPTICAL LITHOGRAPHY; OPTICAL PROXIMITY CORRECTION; PROCESS MODELING; PROCESS MODELS; RULE TABLES; SPACE PROCESSES;

OPTICAL RESOLVING POWER;

EID: 0010480425     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.262828     Document Type: Conference Paper

References (5)

1. O. W. Otto, et. al., "Automated optical proximity correction: a rules-based approach", Optical/Laser Microlithography VII, Timothy A. Brunner, Editor, SPIE 2197 (1994), pp. 278-293.
2. O. W. Otto and R. C. Henderson, "Integrating proximity effects corrections with photomask data preparation", Optical/Laser Microlithography VIII, Timothy A. Brunner, Editor, SPIE (1995).
3. J. C. Garofalo, et. al., "Reduction of ASIC gate-level line-end shortening by mask compensation", Optical/Laser Microlithography VIII, Timothy A. Brunner, Editor, SPIE (1995).
4. J. G. Garofalo, et. al., "Automated layout of mask assist-features for realizing 0.5k1 ASIC lithography", Optical/Laser Microlithography VIII, Timothy A. Brunner, Editor, SPIE (1995).
5. O. W. Otto, Joseph G. Garofalo and R. C. Henderson, "Simplified Rule Generation for Automated Rules-Based Optical Enhancement", Proceedings of the 15th BACUS Annual Symposium 1995 on Photomask Technology and Management (1995).