Characterization of positive DUV resists at 0.25-um polygate using organic and inorganic antireflection schemes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 405-416

  Dass, Sasha K ^a   Orvek, Kevin J ^a   Gruber, Len ^a   Broomfield, Mike C ^a   Tremblay, John ^a   Piasecki, MaryAnn ^a  

^a HEWLETT PACKARD COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; INORGANIC COMPOUNDS; ORGANIC COMPOUNDS; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

DEEP ULTRAVIOLET RADIATION; OPTICAL MICROLITHOGRAPHY;

PHOTORESISTS;

EID: 0031383582     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)