DOF enhancement of isolated line patterns by newly developed assistant pattern method

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 245-256

  Matsuura, Seiji ^a   Hashimoto, Takeo ^a   Uchiyama, Takayuki ^a   Fujimoto, Masashi ^a   Kasama, Kunihiko ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; MASKS; PHASE SHIFT; PROXIMITY SENSORS;

DEPTH OF FOCUS; LINE PATTERNS; NUMERICAL APERTURE; OPTICAL MICROLITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0031364160     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.275967     Document Type: Conference Paper

References (14)