Impact of lens aberrations on optical lithography

IBM Journal of Research and Development

Volumn 41, Issue 1-2, 1997, Pages 57-67

  Brunner, T A ^a,b,c,d,e,f  

^a IBM MICROELECTRONICS   (United States)

^b CARLETON COLLEGE   (United States)

^c MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^d PERKINELMER INC   (United States)

^e IBM   (United States)

^f IEEE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; LENSES; MASKS; PROJECTION SYSTEMS;

HIGH NUMERICAL APERTURE; LITHOGRAPHIC IMAGERY; PHASE SHIFT MASKS; PROCESS WINDOW REDUCTION;

PHOTOLITHOGRAPHY;

EID: 0030714729     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.411.0057     Document Type: Article

References (20)

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