Simulation and optimization of phase-shift masks for dense contact patterns with i-line illumination

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 287-294

  Yang, Chuen Huei ^a   Dai, Chang Ming ^a  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; MASKS; OPTIMIZATION; PERFORMANCE; PHASE SHIFT; SEMICONDUCTOR DEVICE MANUFACTURE;

I-LINE ILLUMINATION; OPTICAL MICROLITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0031384976     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.276023     Document Type: Conference Paper

References (6)