Experimental results on optical proximity correction with variable-threshold resist model

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 458-468

  Cobb, Nicolas B ^a   Zakhor, Avideh ^a   Reihani, Mehran ^a   Jahansooz, Farvardin ^a   Raghavan, Vijaya N ^a  

^a Signamask Inc Berkeley CA USA

Author keywords

[No Author keywords available]

Indexed keywords

CONTROL SYSTEMS; MASKS; PHOTORESISTS; PROXIMITY SENSORS; SCANNING ELECTRON MICROSCOPY;

OPTICAL MICROLITHOGRAPHY; OPTICAL PROXIMITY CORRECTION; VARIABLE-THRESHOLD RESIST MODEL;

PHOTOLITHOGRAPHY;

EID: 0031356739     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.275977     Document Type: Conference Paper

References (7)