Sub-micron BiCMOS process design for manufacturing

Proceedings of the IEEE Bipolar/BiCMOS Circuits and Technology Meeting

Volumn 1992-October, Issue , 1992, Pages 76-83

  Lau, C K ^a   Lin, Chen Hsi ^a   Packwood, Donald L ^a  

^a HEWLETT PACKARD COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BICMOS TECHNOLOGY; BISMUTH COMPOUNDS; DESIGN FOR MANUFACTURABILITY; INTEGRATED CIRCUIT DESIGN; MANUFACTURE;

BI-CMOS PROCESS; BIPOLAR DEVICE; BIPOLAR PROCESS; CMOS DESIGN; CMOS PROCESSS; DESIGN FOR MANUFACTURING; IN-BUILDINGS; MANUFACTURABILITY;

PROCESS DESIGN;

EID: 84966578792     PISSN: 10889299     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/BIPOL.1992.274079     Document Type: Conference Paper

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