Al2O3 on Black Phosphorus by Atomic Layer Deposition: An in Situ Interface Study

ACS Applied Materials and Interfaces

Volumn 7, Issue 23, 2015, Pages 13038-13043

  Zhu, Hui ^a   McDonnell, Stephen ^a   Qin, Xiaoye ^a   Azcatl, Angelica ^a   Cheng, Lanxia ^a   Addou, Rafik ^a   Kim, Jiyoung ^a   Ye, Peide D ^b   Wallace, Robert M ^a  

^a The University of Texas at Dallas   (United States)

^b PURDUE UNIVERSITY   (United States)

Author keywords

aluminum oxide; atomic layer deposition; black phosphorus; surface oxidation; water; X ray photoelectron spectroscopy

Indexed keywords

ALUMINA; ALUMINUM COATINGS; ALUMINUM OXIDE; ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; NUCLEATION; OXYGEN; PHOTOELECTRONS; PHOTONS; WATER; X RAY PHOTOELECTRON SPECTROSCOPY;

CONFORMAL COVERAGE; DEPOSITION TEMPERATURES; EX-SITU ATOMIC FORCE MICROSCOPY; INCUBATION PERIODS; INTERFACE STUDIES; OXYGEN CONTAMINATION; SURFACE FUNCTIONALIZATION; SURFACE OXIDATIONS;

PHOSPHORUS COMPOUNDS;

EID: 84934992512     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/acsami.5b03192     Document Type: Article

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