The effect of graphite surface condition on the composition of Al 2 O3 by atomic layer deposition

Applied Physics Letters

Volumn 97, Issue 8, 2010, Pages

  Pirkle, A ^a   McDonnell, S ^a   Lee, B ^a   Kim, J ^a   Colombo, L ^b   Wallace, R M ^a  

^a The University of Texas at Dallas   (United States)

^b TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC CONTAMINATION; DEPOSITED FILMS; DEPOSITION TEMPERATURES; EX-SITU ATOMIC FORCE MICROSCOPY; GRAPHITE SURFACES; HIGHLY ORIENTED PYROLYTIC GRAPHITE; IN-SITU; PRE-DEPOSITION;

ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; GRAPHITE; NUCLEATION; OZONE; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMS;

EID: 77956220991     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3479908     Document Type: Article

References (18)

1. M. C. Lemme, T. J. Echtermeyer, M. Baus, and H. Kurz, IEEE Electron Device Lett. EDLEDZ 0741-3106 28, 282 (2007). 10.1109/LED.2007.891668
2. G. Fiori and G. Iannaccone, IEEE Electron Device Lett. EDLEDZ 0741-3106 30, 1096 (2009). 10.1109/LED.2009.2028248
3. Y. Xuan, Y. Q. Wu, T. Shen, M. Qi, M. A. Capano, J. A. Cooper, and P. D. Ye, Appl. Phys. Lett. APPLAB 0003-6951 92, 013101 (2008). 10.1063/1.2828338
4. B. Lee, S. -Y. Park, H. -C. Kim, K. Cho, E. M. Vogel, M. J. Kim, R. M. Wallace, and J. Kim, Appl. Phys. Lett. APPLAB 0003-6951 92, 203102 (2008). 10.1063/1.2928228 (Pubitemid 351733920)
5. R. M. Wallace, Electrochem. Soc. Trans. 16, 255 (2008).
6. K. Novoselov, A. Geim, S. Morozov, D. Jiang, Y. Zhang, S. Dubonos, I. Grigorieva, and A. Firsov, Science SCIEAS 0036-8075 306, 666 (2004). 10.1126/science.1102896 (Pubitemid 39440910)
7. M. Ishigami, J. H. Chen, W. G. Cullen, M. S. Fuhrer, and E. D. Williams, Nano Lett. NALEFD 1530-6984 7, 1643 (2007). 10.1021/nl070613a (Pubitemid 47140438)
8. Y. -M. Lin, K. A. Jenkins, A. Valdes-Garcia, J. P. Small, D. B. Farmer, and P. Avouris, Nano Lett. NALEFD 1530-6984 9, 422 (2009). 10.1021/nl803316h
9. I. Meric, M. Y. Han, A. F. Young, B. Ozyilmaz, P. Kim, and K. L. Shepard, Nat. Nanotechnol. NNAABX 1748-3387 3, 654 (2008). 10.1038/nnano.2008.268
10. G. Lee, B. Lee, J. Kim, and K. Cho, J. Phys. Chem. C JPCCCK 1932-7447 113, 14225 (2009). 10.1021/jp904321n
11. D. N. Goldstein, J. A. McCormick, and S. M. George, J. Phys. Chem. C JPCCCK 1932-7447 112, 19530 (2008). 10.1021/jp804296a
12. L. Jeurgens, W. Sloof, F. Tichelaar, and E. Mittemeijer, Surf. Sci. SUSCAS 0039-6028 506, 313 (2002). 10.1016/S0039-6028(02)01432-2 (Pubitemid 34506078)
13. J. van den Brand, P. C. Snijders, W. G. Sloof, H. Terryn, and J. H. W. de Wit, J. Phys. Chem. B JPCBFK 1089-5647 108, 6017 (2004). 10.1021/jp037877f
14. S. T. Jackson and R. G. Nuzzo, Appl. Surf. Sci. ASUSEE 0169-4332 90, 195 (1995). 10.1016/0169-4332(95)00079-8
15. G. Beamson, D. Clark, and D. S. L. Law, Surf. Interface Anal. SIANDQ 0142-2421 27, 76 (1999). 10.1002/(SICI)1096-9918(199902)27:2<76::AID- SIA470>3.0.CO;2-R
16. D. Briggs and G. Beamson, Anal. Chem. ANCHAM 0003-2700 64, 1729 (1992). 10.1021/ac00039a018
17. P. Stone, S. Poulston, R. A. Bennett, N. J. Price, and M. Bowker, Surf. Sci. SUSCAS 0039-6028 418, 71 (1998). 10.1016/S0039-6028(98)00683-9
18. B Lee, G. Mordi, M. J. Kim, Y. J. Chabal, E. M. Vogel, R. M. Wallace, K. J. Cho, L. Colombo, and J. Kim, Appl. Phys. Lett. APPLAB 0003-6951 97. 043107 (2010). 10.1063/1.3467454