Sub-10 nm resistless nanolithography for directed self-Assembly of block copolymers

ACS Applied Materials and Interfaces

Volumn 6, Issue 23, 2014, Pages 21596-21602

  Fernández Regúlez, Marta ^a,d   Evangelio, Laura ^a,b   Lorenzoni, Matteo ^a   Fraxedas, Jordi ^b,c   Pérez Murano, Francesc ^a  

^a INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

^b CATALAN INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY ICN2   (Spain)

^c CSIC   (Spain)

^d CEA LETI   (France)

Author keywords

atomic force microscopy; block copolymer self Assembly; chemical guiding patterns

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL MODIFICATION; NANOLITHOGRAPHY; SELF ASSEMBLY;

BLOCK COPOLYMER SELF-ASSEMBLY; CHEMICAL PATTERN; CHEMICAL SURFACE MODIFICATION; COMBINED EFFECT; DIRECTED SELF-ASSEMBLY; HIGH RESOLUTION; MULTIPLICATION FACTOR; STATE-OF-THE-ART METHODS;

BLOCK COPOLYMERS;

EID: 84917708867     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am506600m     Document Type: Article

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