Advances in directed self assembly integration and manufacturability at 300 mm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8682, Issue , 2013, Pages

  Rathsack, Benjamen ^a   Somervell, Mark ^a   Muramatsu, Makato ^b   Tanouchi, Keiji ^b   Kitano, Takahiro ^b   Nishimura, Eiichi ^c   Yatsuda, Koichi ^b   Nagahara, Seiji ^b   Iwaki, Hiroyuki ^b   Akai, Keiji ^b   Ozawa, Mariko ^b   Negreira, Ainhoa Romo ^b   Tahara, Shigeru ^b   Nafus, Kathleen ^b  

^a TOKYO ELECTRON AMERICA INC   (United States)

^b TOKYO ELECTRON LTD   (Japan)

^c Tokyo Electron Miyagi Ltd   (Japan)

Author keywords

Anneal bake; Block copolymer; Directed self assembly; Double patterning

Indexed keywords

ANNEAL BAKE; DESIGN INTEGRATIONS; DEVELOPMENT PROCESS; DIRECTED SELF-ASSEMBLY; DOUBLE PATTERNING; MATERIALS AND PROCESS; PROCESS IMPROVEMENT; PROCESS INTEGRATION;

BLOCK COPOLYMERS; DEFECTS; EPITAXIAL GROWTH;

SELF ASSEMBLY;

EID: 84878420547     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2012018     Document Type: Conference Paper

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