`Constructive nanolithography': Inert monolayers as patternable templates for in-situ nanofabrication of metal-semiconductor-organic surface structures - a generic approach

Advanced Materials

Volumn 12, Issue 10, 2000, Pages 725-731

  Maoz, Rivka ^a   Frydman, Eli ^a   Cohen, Sidney R ^a   Sagiv, Jacob ^a  

^a WEIZMANN INSTITUTE OF SCIENCE   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; MONOLAYERS;

CONSTRUCTIVE NANOLITHOGRAPHY;

NANOTECHNOLOGY;

EID: 0033733948     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-4095(200005)12:10<725::AID-ADMA725>3.0.CO;2-Z     Document Type: Article

References (28)

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15. b) E. Frydman, R. Maoz, J. Sagiv, unpublished.
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19. Attempts to non-destructively pattern a silane monolayer with a single carbon atom tail (MTS, methyltrichlorosilane) have invariably resulted in patterns showing both friction and topography contrast, within the entire voltage range, giving rise to observable images. This is consistent with past reports of the utilization of some short-tail silane monolayers as ultrathin resists for destructive lip-induced patterning of silicon and other materials [4g], which would suggest that non-destructive patterning may be possible only with compact organic films above a certain critical thickness.
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24. 1[11a] were omitted in Figure 3.
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28. Because of the convolution with the tip, the measured lateral dimensions of the particles may be overestimated. AFM images (taken with a sharp tip) of CdS generated by the same process (1 x CdS deposition) on a laterally unrestricted TFSM surface reveal particles with heights between 0.5 and 1.5 nm and lateral dimensions between 3 and 8 nm [6c].