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Volumn 9052, Issue , 2014, Pages

Rigorous simulation and optimization of the lithography/directed self-assembly co-process

Author keywords

Coarse grained polymer model; Directed self assembly of block copolymers; Lithography simulation; Monte Carlo simulation

Indexed keywords

BLOCK COPOLYMERS; INTELLIGENT SYSTEMS; SELF ASSEMBLY;

EID: 84901792733     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.2047381     Document Type: Conference Paper
Times cited : (2)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.