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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 32, Issue 2, 2014, Pages

Characterization of plasma-enhanced atomic layer deposition of Al 2O3 using dimethylaluminum isopropoxide

(4) Yang, Jialing a Eller, Brianna S a Kaur, Manpuneet b Nemanich, Robert J a

a ARIZONA STATE UNIVERSITY (United States)

b Arizona State University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON CONTAMINATION; ENERGY-LOSS SPECTROSCOPY; INDEX OF REFRACTION; OXYGEN PLASMA EXPOSURE; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; SATURATION DENSITY; X RAY PHOTOEMISSION SPECTROSCOPY; X RAY REFLECTIVITY;

ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; DEPOSITION; IONIZATION OF GASES; OXYGEN; PHOTOELECTRON SPECTROSCOPY; PLASMAS; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY; SURFACE ROUGHNESS; X RAYS;

ALUMINUM;

EID: 84900674639 PISSN: 07342101 EISSN: 15208559 Source Type: Journal
DOI: 10.1116/1.4866378 Document Type: Article

Times cited : (25)

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