Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process

Thin Solid Films

Volumn 534, Issue , 2013, Pages 515-519

  Lee, Jong Geol ^a   Kim, Hyun Gi ^a   Kim, Sung Soo ^a  

^a Kyung Hee University   (South Korea)

Author keywords

Aluminum oxide; Diffusion barrier properties; Flexible display; Plasma enhanced atomic layer deposition; Water vapor transmission rates

Indexed keywords

ALUMINUM OXIDES; BARRIER PROPERTIES; DIFFUSION BARRIER PROPERTY; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; POLYETHYLENE NAPHTHALATE; PROCESS PARAMETERS; WATER VAPOR TRANSMISSION RATE; WORKING PRESSURES;

ALUMINUM; BYPRODUCTS; DEPOSITION; FLEXIBLE DISPLAYS; OXIDES; PLASMAS; VAPORS;

SUBSTRATES;

EID: 84876674501     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.02.125     Document Type: Article

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