Electrical properties of alumina films by plasma-enhanced atomic layer deposition

Electrochemical and Solid-State Letters

Volumn 7, Issue 8, 2004, Pages

  Lim, Jung Wook ^a   Yun, Jin Sun ^a  

^a Korea Basic Science Institute (KBSI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC PROPERTIES; ELECTROLUMINESCENCE; PERMITTIVITY; PLASMA APPLICATIONS; SPUTTERING; SUBSTRATES; THERMODYNAMICS; THIN FILM TRANSISTORS;

ALUMINA FILMS; GATE DIELECTRIC LAYERS; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION (PEALD);

ALUMINA;

EID: 4344583052     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1756541     Document Type: Article

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