A comparative study of the UV optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition

Thin Solid Films

Volumn 410, Issue 1-2, 2002, Pages 86-93

  Thielsch, R ^a   Gatto, A ^a   Heber, J ^a   Kaiser, N ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

Ion bombardment; Optical coatings; Oxides; Physical vapour deposition (PVD)

Indexed keywords

ALUMINA; BAND STRUCTURE; DEGRADATION; DIELECTRIC DEVICES; EVAPORATION; FREE ELECTRON LASERS; INFRARED SPECTROSCOPY; ION BEAM ASSISTED DEPOSITION; LASER DAMAGE; LIGHT INTERFERENCE; MULTILAYERS; PHOTOMETRY; SILICA; THIN FILMS; ULTRAVIOLET RADIATION; X RAY DIFFRACTION ANALYSIS;

PLASMA ION-ASSISTED DEPOSITION;

OPTICAL COATINGS;

EID: 0036574788     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00208-0     Document Type: Article

References (26)