Rapid prototyping of fresnel zone plates via direct Ga+ ion beam lithography for high-resolution x-ray imaging

ACS Nano

Volumn 7, Issue 11, 2013, Pages 9788-9797

  Keskinbora, Kahraman ^a   Grévent, Corinne ^a   Eigenthaler, Ulrike ^a   Weigand, Markus ^a   Schütz, Gisela ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

extreme ultraviolet radiation; focused ion beam (FIB); Fresnel zone plates; ion beam lithography (IBL); nano patterning; nanolithography; soft X rays; synchrotron radiation; X ray microscopy

Indexed keywords

EXTREME ULTRAVIOLET RADIATIONS; FRESNEL ZONE PLATE; NANOPATTERNING; SOFT X-RAY; X RAY MICROSCOPY;

ELECTRON BEAM LITHOGRAPHY; GALLIUM; NANOLITHOGRAPHY; OPTICS; SUN; SYNCHROTRON RADIATION; X RAY MICROSCOPES; X RAYS;

FABRICATION;

EID: 84888856402     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn403295k     Document Type: Article

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