Exploration of the ultimate patterning potential achievable with focused ion beams

Ultramicroscopy

Volumn 109, Issue 5, 2009, Pages 457-462

  Gierak, J ^a   Bourhis, E ^a   Faini, G ^a   Patriarche, G ^a   Madouri, A ^a   Jede, R ^b   Bruchhaus, L ^b   Bauerdick, S ^b   Schiedt, B ^c   Biance, A L ^c   Auvray, L ^c  

^a CNRS   (France)

^b RAITH GmbH   (Germany)

^c UNIVERSITÉ D EVRY VAL D ESSONNE   (France)

Author keywords

Focused ion beam; Nano patterning; Nanopore; SiC membrane

Indexed keywords

HIGH RESOLUTIONS; NANO FABRICATIONS; NANO-PATTERNING; NANO-SCIENCES; NANO-STRUCTURING; NANOPORE; NEW INSTRUMENTS; SIC MEMBRANE;

BEAM PLASMA INTERACTIONS; FABRICATION; ION BOMBARDMENT; IONS; NANOPORES; NANOSCIENCE; SILICON CARBIDE; YTTERBIUM COMPOUNDS;

FOCUSED ION BEAMS;

GALLIUM; SILICON CARBIDE;

ARTICLE; FOCUSED ION BEAM; NANOFABRICATION; NANOPORE; RADIATION BEAM; SOLID STATE; TRANSMISSION ELECTRON MICROSCOPY;

EID: 62749142556     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2008.09.007     Document Type: Article

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