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Volumn 19, Issue 39, 2008, Pages
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Full-field hard x-ray microscopy below 30 nm: A challenging nanofabrication achievement
a,b a c c a a a a a a,d,e,f c f f b g h
h
EPFL
(Switzerland)
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Author keywords
[No Author keywords available]
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Indexed keywords
NANOTECHNOLOGY;
PHOTORESISTS;
X RAY MICROSCOPES;
FEATURE SIZES;
HARD X RAYS;
NANO-FABRICATION;
ASPECT RATIO;
NANOMATERIAL;
ARTICLE;
ELECTROCHEMISTRY;
ELECTRON BEAM;
MEASUREMENT;
NANOFABRICATION;
PRIORITY JOURNAL;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY MICROANALYSIS;
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EID: 51349139918
PISSN: 09574484
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/19/39/395302 Document Type: Article |
Times cited : (97)
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References (11)
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