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Volumn 19, Issue 39, 2008, Pages

Full-field hard x-ray microscopy below 30 nm: A challenging nanofabrication achievement

Author keywords

[No Author keywords available]

Indexed keywords

NANOTECHNOLOGY; PHOTORESISTS; X RAY MICROSCOPES;

EID: 51349139918     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/39/395302     Document Type: Article
Times cited : (97)

References (11)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.