High-efficiency fresnel zone plates for hard X-rays by 100 keV e-beam lithography and electroplating

Journal of Synchrotron Radiation

Volumn 18, Issue 3, 2011, Pages 442-446

  Gorelick, Sergey ^a   Vila Comamala, Joan ^a   Guzenko, Vitaliy A ^a   Barrett, Ray ^b   Salomé, Murielle ^b   David, Christian ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

Author keywords

Au electroplating; electron beam lithography; Fresnel zone plate; hard X rays; PMMA; X ray optics

Indexed keywords

AU ELECTROPLATING; DEFECT-FREE; E-BEAM LITHOGRAPHY; EFFICIENCY MEASUREMENT; FRESNEL ZONE PLATE; HARD X RAY; HIGH EFFICIENCY; HIGH QUALITY; PMMA; SPATIALLY RESOLVED; THEORETICAL VALUES; X-RAY ENERGIES;

DIFFRACTION EFFICIENCY; EFFICIENCY; ELECTRON BEAM LITHOGRAPHY; ELECTROPLATING; FABRICATION; OPTICAL INSTRUMENTS; X RAYS;

PLATES (STRUCTURAL COMPONENTS);

EID: 79955563570     PISSN: 09090495     EISSN: 16005775     Source Type: Journal    
DOI: 10.1107/S0909049511002366     Document Type: Article

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