Focused ion beam technology and ultimate applications

Semiconductor Science and Technology

Volumn 24, Issue 4, 2009, Pages

  Gierak, Jacques ^a  

^a UNIV PARIS SUD   (France)

Author keywords

[No Author keywords available]

Indexed keywords

BIOLOGICAL MOLECULE; DIRECT-PATTERNING; FOCUSED ION BEAM TECHNOLOGY; FUNCTIONALIZATIONS; GRAPHITE SUBSTRATE; II-IV SEMICONDUCTORS; ION OPTICS; LOCAL DEFECTS; OPERATING PRINCIPLES; QUANTUM DOT; SELECTIVE EPITAXY; SOLID-STATE NANOPORE;

CRYSTAL GROWTH; FAILURE ANALYSIS; GRAPHITE; ION SOURCES; LINEAR CONTROL SYSTEMS; LIQUID METALS; MAGNETIC THIN FILMS; METAL IONS; QUALITY ASSURANCE; SAFETY FACTOR; SEMICONDUCTOR QUANTUM DOTS; TECHNOLOGY;

FOCUSED ION BEAMS;

EID: 68849101377     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/24/4/043001     Document Type: Article

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