Focused ion beam lithography- Overview and new approaches

Proceedings of the International Conference on Microelectronics

Volumn 24 II, Issue , 2004, Pages 459-462

  Arshak, K ^a   Mihov, M ^a   Arshak, A ^a   McDonagh, D ^b   Sutton, D ^c  

^a UNIVERSITY OF LIMERICK   (Ireland)

^b Toumaz Technology Ltd   (United Kingdom)

^c Athletic Rehabilitation Therapy Ireland   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; CMOS INTEGRATED CIRCUITS; ELECTRON BEAMS; ETCHING; MASS SPECTROMETRY; NANOTECHNOLOGY; TRANSISTORS;

DIRECT ION MILLING; MICROFABRICATION; TOP SURFACE IMAGING (TSI);

ION BEAM LITHOGRAPHY;

EID: 3142741619     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)

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