Novel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching

Advanced Materials

Volumn 25, Issue 43, 2013, Pages 6261-6265

  Zanchetta, Erika ^a   Della Giustina, Gioia ^a   Grenci, Gianluca ^b,c   Pozzato, Alessandro ^b   Tormen, Massimo ^b   Brusatin, Giovanna ^a  

^a Dipartimento di Ingegneria Meccanica Settore Materiali   (Italy)

^b LABORATORIO TASC   (Italy)

^c NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

alumina; direct patterning; dry etching; etching masks; inorganic resists; sol gel

Indexed keywords

ALUMINA; NANOIMPRINT LITHOGRAPHY; SOL-GEL PROCESS; SOL-GELS;

DIRECT-PATTERNING; DRY ETCHING PROCESS; ETCH RESISTANCE; ETCHING MASKS; HYBRID ORGANIC-INORGANIC; INORGANIC RESIST; LATERAL RESOLUTION; LITHOGRAPHIC TOOLS;

DRY ETCHING;

EID: 84887997511     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.201301555     Document Type: Article

References (31)

1. G. Nakagawa, K. Miura, M. Makiuchi, M. Yano, Opt. Eng. 1994, 33, 3547.
2. J.-M. Lee, D. Lee, Y. Baek, Opt. Commun. 2013, 289, 69.
3. Ü. Sökmen, M. Balke, A. Stranz, S. Fündling, E. Peiner, H.-H. Wehmann, A. Waag, Proc. SPIE 2009, 7362, 736213.
4. Ü. Sökmen, A. Stranz, S. Fündling, S. Merzsch, R. Neumann, H.-H. Wehmann, E. Peiner, A. Waag, Microsyst. Technol. 2010, 16, 863.
5. M. J. Walker, Proc. SPIE 2001, 4407, 89.
6. Z. Liu, Y. Wu, B. Harteneck, D. Olynick, Nanotechnology 2013, 24, 015305.
7. J. Grym, Semiconductor Technologies, InTech, Rijeka, Croatia 2010.
8. M. Serry, M. Ibrahim, S. Sedky, 2012 IEEE 25th Int. Conf. on Micro Electro Mechanical Systems (MEMS) 2012, 321.
9. K.-M. Lim, S. Gupta, C. Ropp, E. Waks, Microelectron. Eng. 2011, 88, 994.
10. B. Y. Zong, P. Ho, G. C. Han, G. M. Chow, J. S. Chen, J. Micromech. Microeng. 2013, 23, 035038.
11. M. D. Henry, S. Walavalkar, A. Homyk, A. Scherer, Nanotechnology 2009, 20, 255305.
12. A. Kravchenko, A. Shevchenko, V. Ovchinnikov, A. Priimagi, M. Kaivola, Adv. Mater. 2011, 23, 4174.
13. A. Frommhold, J. Manyam, R. E. Palmer, A. P. G. Robinson, Microelectron. Eng. 2012, 98, 552.
14. Y. Tseng, A. U. Mane, J. W. Elam, S. B. Darling, Adv. Mater. 2012, 24, 2608.
15. Z. Cui, Micro-Nanofabrication: Technologies and Applications, Higher Education Press, Beijing 2005.
16. B. Zong, G. Han, Y. Zheng, L. An, T. Liu, K. Li, J. Qiu, Z. Guo, P. Luo, H. Wang, B. Liu, Adv. Funct. Mater. 2009, 19, 1437.
17. G. Brusatin, G. Della Giustina, F. Romanato, M. Guglielmi, Nanotechnology 2008, 19, 175306.
18. G. Brusatin, G. Della Giustina, J. Sol-Gel Sci. Technol. 2011, 60, 299.
19. E. Zanchetta, V. Auzelyte, J. Brugger, A. V. Savegnago, G. Della Giustina, G, Brusatin, Microelectron. Eng. 2012, 98, 176.
20. L. Brigo, V. Auzelyte, K. A. Lister, J. Brugger, G. Brusatin, Nanotechnology 2012, 23, 325302.
21. G. Grenci, G. Della Giustina, A. Pozzato, G. Brusatin, M. Tormen, Microelectron. Eng. 2011, 88, 1964.
22. M. A. Hockey, Q. Lin, E. Calderas, Proc. SPIE 2012, 8456, 84560Q.
23. B. Liu, S. T. Ho, J. Electrochem. Soc. 2008, 155, 57.
24. L. O'Faolain, M. V. Kotlyar, N. Tripathi, R. Wilson, T. F. Krauss, J. Vac. Sci. Technol. B 2006, 24, 336.
25. D. J. Maloney, W. M. Lee, P. J. Roman, M. A. Fury, R. H. Hill, USPatent 6,566,276 B2, 2003.
26. G. Grenci, A. Pozzato, A. Carpentiero, E. Sovernigo, M. Tormen, Microelectron. Eng. 2011, 88, 2552.
27. J. Coates, Encyclopedia of Analytical Chemistry, R. A. Meyers, 2000, John Wiley & Sons Ltd, Chichester, 10815.
28. A. R. Chowdhuri, C. G. Takoudis, Thin Solid Films 2004, 446, 155.
29. T. M. H. Costa, M. R. Gallas, E. V. Benvenutti, J. A. H. da Jornada, J. Phys. Chem. B 1999, 103, 4278.
30. E. Di Fabrizio, A. Nucara, M. Gentili, R. Cingolani, Rev. Sci. Instrum. 1999, 70, 1605.
31. F. Romanato, E. Di Fabrizio, L. Vaccari, M. Altissimo, D. Cojoc, L. Businaro, S. Cabrini, Microelectron. Eng. 2001, 57, 101.