Development of metal etch mask by single layer lift-off for silicon nitride photonic crystals

Microelectronic Engineering

Volumn 88, Issue 6, 2011, Pages 994-998

  Lim, Kang Mook ^a   Gupta, Shilpi ^a   Ropp, Chad ^a   Waks, Edo ^a  

^a UNIVERSITY OF MARYLAND   (United States)

Author keywords

Metal liftoff; Nanofabrication; Nanophotonics; Photonic crystals (PC); Silicon nitride (SiN)

Indexed keywords

E-BEAM RESIST; ETCH MASK; ETCH UNIFORMITY; FABRICATED STRUCTURES; FEATURE SIZES; HIGH ASPECT RATIO; METAL ETCH; NANO-SCALE PATTERNS; NANOFABRICATION; PATTERN STRUCTURE; QUALITY FACTORS; SINGLE LAYER; TWO-DIMENSIONAL PHOTONIC CRYSTALS;

ASPECT RATIO; ELECTRON BEAMS; FABRICATION; METALS; NANOPHOTONICS; SILICON NITRIDE;

PHOTONIC CRYSTALS;

EID: 79952445349     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2010.12.113     Document Type: Article

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