A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio

Journal of Micromechanics and Microengineering

Volumn 23, Issue 3, 2013, Pages

  Zong, B Y ^a   Ho, P ^a,b   Han, G C ^a   Chow, G M ^b   Chen, J S ^b  

^a DATA STORAGE INSTITUTE   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

DEVELOPING PROCESS; DIFFERENT SHAPES; ELECTRON BEAM RESIST; HIGH ASPECT RATIO; NANO PATTERN; NANOFEATURES; NEGATIVE TONES; SIMPLE APPROACH;

ENGINEERING; MICROMECHANICS;

ASPECT RATIO;

EID: 84878151256     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/23/3/035038     Document Type: Article

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