Design of a beamline for soft and deep lithography on third generation synchrotron radiation source

Review of Scientific Instruments

Volumn 70, Issue 3, 1999, Pages 1605-1613

  Di Fabrizio, E ^a   Nucara, A ^b   Gentili, M ^c   Cingolani, R ^d  

^a LABORATORIO TASC   (Italy)

^b UNIVERSITÀ DI ROMA LA SAPIENZA   (Italy)

^c Ist Di Elettron Stato Solido C   (Italy)

^d INFM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001428591     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1149640     Document Type: Article

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