Nanofabrication of hard X-ray optics by metal electroplating in a dry etched mechanically stable inorganic template

Microelectronic Engineering

Volumn 88, Issue 8, 2011, Pages 2552-2555

  Grenci, Gianluca ^a   Pozzato, Alessandro ^a,b   Carpentiero, Alessandro ^a   Sovernigo, Enrico ^a,c   Tormen, Massimo ^a,b  

^a LABORATORIO TASC   (Italy)

^b ThunderNIL Srl   (Italy)

^c UNIVERSITY OF TRIESTE   (Italy)

Author keywords

Dry etching; EBL; HSQ; X ray lithography; X ray microscopy; X ray optics

Indexed keywords

EBL; ETCH STOP; HARD INTERLAYER; HARD TEMPLATES; HARD X-RAY OPTICS; HIGH RESOLUTION; HSQ; INORGANIC INTERLAYERS; INORGANIC TEMPLATES; MECHANICALLY STABLE; METAL ELECTROPLATING; NANO-STRUCTURED; NANOFABRICATION PROCESS; NICKEL LAYERS; OXYGEN PLASMAS; PATTERN TRANSFERS; PHASE-SHIFTING; PROCESS SCHEMES; RATIO FEATURES; SEED LAYER; THIN METAL FILMS; X RAY MICROSCOPY; X-RAY ABSORBER;

ASPECT RATIO; DRY ETCHING; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; MECHANICAL STABILITY; PLASMA ETCHING; PLASMA STABILITY; SILICON COMPOUNDS; WET ETCHING; X RAY LITHOGRAPHY; X RAY OPTICS;

X RAYS;

EID: 79960046432     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2011.02.007     Document Type: Conference Paper

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