The effectiveness of metal oxide nanocrystal-enhanced polymers as hardmasks for photolithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8456, Issue , 2012, Pages

  Hockey, Mary Ann ^a   Lin, Qin ^a   Calderas, Eric ^a  

^a BREWER SCIENCE INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPTH OF FOCUS; ETCH SELECTIVITY; HARDMASKS; LITHOGRAPHY PROCESS; METAL OXIDES; PATTERN COLLAPSE; PATTERN TRANSFERS; PROCESS WINDOW; SPIN-ON; ZNO;

HAFNIUM OXIDES; LITHOGRAPHY; METALLIC COMPOUNDS; NANOCRYSTALS; NANOPHOTONICS; PHOTORESISTS; ZINC OXIDE;

POLYMERS;

EID: 84872465396     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.928964     Document Type: Conference Paper

References (4)

1. Shamiryan, D.; Ballanov, M.; Cleas, M.; Boullart, W.; Paraschiv, V. "Selective Removal of High-k Gate Dielectrics," Chemical Engineering Communications, vol. 196, pp. 1475-1535, 2009.
2. Das, R.N.; Egitto, F.D.; Antesberger, T.E.; Marconi, F.; Lin H.; Lauffer, J.M.; Markovich, V.R. "Laser processing of 3-D structures for embedded and integrated components: An application of flexible and printable nanomaterials in microelectronics," IEEE Electronics Components and Technology Conference, 2008.
3. Morford, R.V.; Mercado, R.L.; Planje, C.E.; Flaim, T.D. "High refractive photocurable resins," Proceedings of SPIE, vol. 5724, pp. 34-41, 2005.
4. Woehrle, G.H.; Hutchison, J.E.; Ozkar, S.; Finke, R.G. "Analysis of Nanoparticle Transmission Electron Microscopy Data Using a Public-Domain Image-Processing Program, Image," Turkish Journal of Chemistry, vol. 30: pp. 1-13, 2006.