SCOPUS 정보 검색 플랫폼

Advanced Materials

Volumn 23, Issue 36, 2011, Pages 4174-4177

Optical interference lithography using azobenzene-functionalized polymers for micro-and nanopatterning of silicon

(5) Kravchenko, Aleksandr a Shevchenko, Andriy a Ovchinnikov, Victor a Priimagi, Arri a,b Kaivola, Matti a

a AALTO UNIVERSITY (Finland)

b TOKYO INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

azobenzene; lithography; nanopatterning; surface relief grating

Indexed keywords

NANOPATTERNING; OPTICAL INTERFERENCE LITHOGRAPHY; POTENTIAL APPLICATIONS; SILICON NANOSTRUCTURES; SURFACE RELIEF GRATINGS;

AZOBENZENE; FIBER OPTIC SENSORS; FUNCTIONAL MATERIALS; LIGHT INTERFERENCE; LITHOGRAPHY; PHOTORESISTS;

FUNCTIONAL POLYMERS;

AZO COMPOUND; AZOBENZENE; POLYMER; SILICON;

ARTICLE; CHEMISTRY; LIGHT RELATED PHENOMENA; METHODOLOGY; MICROTECHNOLOGY; NANOTECHNOLOGY; PRINTING;

AZO COMPOUNDS; MICROTECHNOLOGY; NANOTECHNOLOGY; OPTICAL PROCESSES; POLYMERS; PRINTING; SILICON;

EID: 80053199536 PISSN: 09359648 EISSN: 15214095 Source Type: Journal
DOI: 10.1002/adma.201101888 Document Type: Article

Times cited : (110)

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